全面回顾凸、凹角在硅微加工大部分基于各向异性湿法化学腐蚀|微型和纳米系统信件|全文188博金宝官网登录188bet登录入口</tgydF4y2Baitle> <link rel="stylesheet" media="screen" href="//www.kei-daikouji.com/static/app-springeropen/css/core-article-f3872e738d.css"> <link rel="stylesheet" media="screen" href="//www.kei-daikouji.com/static/app-springeropen/css/core-b516af10bc.css"> <link rel="stylesheet" media="print" href="//www.kei-daikouji.com/static/app-springeropen/css/print-b8af42253b.css"> <style>@media only print, only all and (prefers-color-scheme: no-preference), only all and (prefers-color-scheme: light), only all and (prefers-color-scheme: dark) { button{line-height:inherit}html,label{font-family:-apple-system,BlinkMacSystemFont,Segoe UI,Roboto,Oxygen-Sans,Ubuntu,Cantarell,Helvetica 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data-track-label="link">发表:<tgydF4y2Baime datetime="2015-05-27">2015年5月27日</tgydF4y2Baime></a></li> </ul> <h1 class="c-article-title" data-test="article-title" data-article-title="">全面回顾凸、凹角在硅微加工大部分基于各向异性湿法化学腐蚀</gydF4y2Bah1> <ul class="c-article-author-list c-article-author-list--short" data-test="authors-list" data-component-authors-activator="authors-list"> <li class="c-article-author-list__item"><a data-test="author-name" data-track="click" data-track-action="open author" data-track-label="link" href="#auth-Prem-Pal" data-author-popup="auth-Prem-Pal" data-corresp-id="c1">但是过犹不及的朋友<gydF4y2Basvg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-email"></use> </svg></a><sup class="u-js-hide"><a href="#Aff1">1</一个></sup>&</lgydF4y2Bai> <li class="c-article-author-list__item"><a data-test="author-name" data-track="click" data-track-action="open author" data-track-label="link" href="#auth-Kazuo-Sato" data-author-popup="auth-Kazuo-Sato">Kazuo佐藤</一个><sup class="u-js-hide"><a href="#Aff2">2</一个></sup></li> </ul> <p class="c-article-info-details" data-container-section="info"><a data-test="journal-link" href="//www.kei-daikouji.com/" data-track="click" data-track-action="journal homepage" data-track-category="article body" data-track-label="link"><i data-test="journal-title">188博金宝官网登录</i></a><b data-test="journal-volume"><span class="u-visually-hidden">体积</gydF4y2Baspan>3</gydF4y2Bab>文章编号:<gydF4y2Baspan data-test="article-number">6</gydF4y2Baspan>(<gydF4y2Baspan data-test="article-publication-year">2015年</gydF4y2Baspan>)<一个href="#citeas" class="c-article-info-details__cite-as u-hide-print" data-track="click" data-track-action="cite this article" data-track-label="link">引用这篇文章</一个></p> <div class="c-article-metrics-bar__wrapper u-clear-both"> <ul class="c-article-metrics-bar u-list-reset"> <li class=" c-article-metrics-bar__item"><p class="c-article-metrics-bar__count">28 k<gydF4y2Baspan class="c-article-metrics-bar__label">访问</gydF4y2Baspan></p></li> <li class="c-article-metrics-bar__item"><p class="c-article-metrics-bar__count">67年<gydF4y2Baspan class="c-article-metrics-bar__label">引用</gydF4y2Baspan></p></li> <li class="c-article-metrics-bar__item"><p class="c-article-metrics-bar__details"><a href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/metrics" data-track="click" data-track-action="view metrics" data-track-label="link" rel="nofollow">指标<gydF4y2Baspan class="u-visually-hidden">细节</gydF4y2Baspan></a></p></li> </ul> </div> </div> <section aria-labelledby="Abs1" data-title="Abstract" lang="en"> <div class="c-article-section" id="Abs1-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Abs1">文摘</gydF4y2Bah2> <div class="c-article-section__content" id="Abs1-content"> <p>湿基于各向异性蚀刻硅微加工制造的一个重要技术独立(如悬臂)和固定(如腔)结构在不同方向硅片为各种应用程序在微机电系统(MEMS)。{111}飞机腐蚀速率最慢飞机在各种各向异性蚀刻剂,因此,长期腐蚀总是导致的{111}面装配式结构的侧壁。在潮湿的各向异性腐蚀,削弱了发生在面具的挤压和弯曲的边缘角落模式在晶片表面。削弱的速度取决于类型的腐蚀剂和面具的形状边缘和角落。此外,削弱了发生在直边,如果它们不包含{111}的飞机。{100}和{110}硅片最广泛应用于MEMS以及微电子制造。</gydF4y2Bap> <p>综述了制造技术的凸角在{100}和{110}硅片使用各向异性湿化学腐蚀。制备方法主要分为两大类:<gydF4y2Bai>角补偿方法</gydF4y2Bai>和<gydF4y2Bai>两个步骤蚀刻技术</gydF4y2Bai>。在角落补偿方法中,添加额外的掩模图形在拐角处。由于额外的几何,蚀刻在凸角,因此延迟技术依赖于时间延迟的蚀刻。补偿设计强烈的形状和大小取决于类型的腐蚀剂,蚀刻深度和晶片表面的取向。本文讨论了各种补偿设计发布到目前为止。<gydF4y2Bai>两步蚀刻法</gydF4y2Bai>是用于制造完美的凸角。自从非常锋利的凸角是由{111}的交集飞机,每一步的蚀刻凸角的定义的一个方面。在这种方法中,两种不同的方式是用来执行刻蚀过程,因此可以分为两个部分。在一个案例中,光刻执行步骤的第一步刻蚀后,而在第二种情况下,所有蚀刻步骤进行蚀刻过程之前,但当地的氧化硅(LOCOS)过程完成后蚀刻的第一步。所有技术的优缺点进行了讨论。</gydF4y2Bap> </div> </div> </section> <section data-title="Introduction"> <div class="c-article-section" id="Sec1-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec1">介绍</gydF4y2Bah2> <div class="c-article-section__content" id="Sec1-content"> <p>微加工是最受欢迎的技术,微/纳米结构的形成为微机电系统(MEMS) [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e363">1</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 8" title="8gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e366">8</一个>]。它分为两类:<gydF4y2Bai>表面微加工</gydF4y2Bai>和<gydF4y2Bai>大部分微加工</gydF4y2Bai>提出了图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">1</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 9" title="9gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e379">9</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 10" title="10gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e382">10</一个>]。表面微加工的微/纳米结构实现的沉积和蚀刻薄结构和牺牲层的衬底,而大部分微加工定义等选择性地蚀刻在一个衬底结构独立机械结构(如梁和膜)或三维特性(如蛀牙/槽、小孔和平顶山)。硅具有良好的机械性能,使它成为一个有前途的候选人材料微加工和微工程学<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 11" title="11gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e385">11</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 12" title="12gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e388">12</一个>]。大部分微加工进一步分为两个主要的类:<gydF4y2Bai>湿体微加工</gydF4y2Bai>和<gydF4y2Bai>干散货微加工</gydF4y2Bai>。方法可以用于各向同性或各向异性蚀刻。干蚀刻涉及气相在等离子体蚀刻剂的使用<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 13" title="13gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e398">13</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 18" title="18gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e401">18</一个>]。由于等离子体参与干蚀刻,它通常被称为等离子体蚀刻。离子和基于激光蚀刻也属于干蚀刻(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 19" title="19gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e404">19</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 20" title="20.gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e407">20.</一个>]。干蚀刻过程通常蚀刻定向和腐蚀速率几乎是晶体取向无关的。另一方面,湿蚀刻在液相(“湿”)进行蚀刻剂,可以进一步细分为<gydF4y2Bai>等向性蚀刻</gydF4y2Bai>和<gydF4y2Bai>各向异性腐蚀</gydF4y2Bai>如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">1</一个>。在各向同性腐蚀,腐蚀速率并不依赖于衬底的方向即蚀刻四面八方以相等的利率收益。氢氟酸的混合物(HF)、氮(HNO<gydF4y2Basub>3</gydF4y2Basub>)和醋酸(CH<gydF4y2Basub>3</gydF4y2Basub>羧基)酸(例如海航集团)是最常用的硅各向同性湿蚀刻剂(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 21" title="21gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e424">21</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 22" title="22gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e427">22</一个>]。在这个组合,可以取代醋酸水和硅的腐蚀速率取决于酸的混合物的比例。在湿的情况下各向异性腐蚀,腐蚀速率取决于基质的晶体平面的方向。各向异性蚀刻剂蚀刻材料快得多比在另一个方向,随着时间的推移暴露晶面腐蚀最慢(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e430">1</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 2" title="2gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e434">2</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 4" title="4gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e437">4</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 10" title="10gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e440">10</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 23" title="23gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e443">23</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 27" title="27gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e446">27</一个>]。几种碱性水溶液,如氢氧化钾溶液(KOH) [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 23" title="23gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e449">23</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 26" title="26gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e453">26</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 28" title="28gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e456">28</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 35" title="35gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e459">35</一个>氢氧化),tetramethylammonium (TMAH) [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 27" title="27gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e462">27</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 36" title="36gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e465">36</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 45" title="45gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e468">45</一个>),乙二胺邻苯二酚水(EDP或电物理加工)<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 26" title="26gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e472">26</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 35" title="35gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e475">35</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 46" title="46gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e478">46</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 47" title="47gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e481">47</一个>],[肼<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 23" title="23gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e484">23</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 48" title="48gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e487">48</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 49" title="49gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e491">49</一个>],氢氧化铵[<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 50" title="50gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e494">50</一个>,氢氧化铯(CsOH) [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 51" title="51gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e497">51</一个>)是用于湿硅各向异性腐蚀。在这些蚀刻剂,氢氧化钾(KOH)和氢氧化tetramethylammonium (TMAH)是最常用的。TMAH是一个互补金属氧化物半导体(CMOS)兼容的腐蚀剂,因为它不包含碱金属离子,与KOH。在各种各样的碱性溶液,{111}是最慢的蚀刻飞机,而{110}、{100}和其他高指数飞机快速腐蚀的飞机。腐蚀率和蚀刻表面形态取决于几个参数的腐蚀剂如浓度、腐蚀温度,搅拌在蚀刻过程中,添加剂等。然而腐蚀过程的类型的选择(干或湿)主要取决于最终产品的要求。湿干刻蚀各向异性蚀刻有几个优势包括低成本、简单的实验装置,容易处理,批处理,定向腐蚀剂,无与伦比的能力释放机械结构等。定向腐蚀剂率是用来开发微观结构与垂直和倾斜的侧壁。潮湿的各向异性腐蚀已广泛应用于硅基MEMS制造如喷墨头(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e500">1</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 2" title="2gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e503">2</一个>),rf微机电系统组件(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 52" title="52gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e506">52</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 55" title="55gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e510">55</一个>)、机械传感器(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 56" title="56gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e513">56</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 61" title="61年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e516">61年</一个>)、热传感器(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 62" title="62年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e519">62年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 64" title="64年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e522">64年</一个>微/纳米热量计[],<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 65" title="65年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e525">65年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 67" title="67年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e529">67年</一个>)、微流体设备(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 68" title="68年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e532">68年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 71" title="71年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e535">71年</一个>),和生物/化学传感器[<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 72" title="72年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e538">72年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 75" title="75年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e541">75年</一个>),原子力显微镜技巧(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 76" title="76年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e544">76年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 78" title="78年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e548">78年</一个>)等。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-1" data-title="Figure 1"> <figure> <figcaption> <b id="Fig1" class="c-article-section__figure-caption" data-test="figure-caption-text">图1</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/1" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig1_HTML.gif?as=webp"> <img aria-describedby="Fig1" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig1_HTML.gif" alt="图1gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-1-desc"> <p><b>分类的微加工的实现MEMS / NEMS微/纳米机械结构。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/1" data-track-dest="link:Figure1 Full size image" aria-label="Full size image figure 1" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>在潮湿的各向异性腐蚀,稳定的蚀刻概要文件由慢的腐蚀速率飞机(例如{111})。如果{100}的晶片,{111}飞机出现在边缘对齐沿< 110 >方向如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">2</一个>(一)和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>(一个)。这些飞机形成一个正方形形状腔/槽。如果{110}的晶片,六个{111}面暴露在腐蚀过程中。的交集在{110}{111}飞机表面形成一个多边形,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">2</一个>(b)和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>(b) (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e588">1</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 79" title="79年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e592">79年</一个>]。多边形的边缘结构的沿< 112 >和< 110 >方向。使用< 112 >和< 110 >方向,可以形成不同形状的模式。垂直{111}< 112 >方向包含飞机,而< 110 >方向包括倾斜的{111}面。< 112 >方向可以用来形成一个平行四边形结构。{111}平面的交点形成一个凹角(< 180即角落内)或一个凸角(> 180°即角落把外)。虽然两种类型的角落有界的{111}飞机、腐蚀特征是完全相反的。在腐蚀凹角仍然保持不变,而凸角立即被腐蚀剂导致削弱。因此保护结构的制造与凸角是一个单调乏味的任务为{100}和{110}硅片。削弱的机制(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 79" title="79年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e595">79年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 87" title="87年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e598">87年</一个>)和凸角的制造(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 24" title="24gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e601">24</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 88" title="88年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e604">88年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e607">128年</一个>被广泛研究。尽管我们在2007年发表了一篇评论文章制造的凸角,它涵盖的技术报道高达2005 Si{100}只晶片(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 109" title="109年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e611">109年</一个>]。的制备方法在{110}晶圆凸角并非本文中讨论。此外,在过去的几年里,不同类型的保护技术报告的凸角不同的蚀刻剂为{100}和{110}硅片(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 119" title="119年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e614">119年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e617">128年</一个>]。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-2" data-title="Figure 2"> <figure> <figcaption> <b id="Fig2" class="c-article-section__figure-caption" data-test="figure-caption-text">图2</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/2" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig2_HTML.gif?as=webp"> <img aria-describedby="Fig2" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig2_HTML.gif" alt="图2gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-2-desc"> <p><b>示意图说明不同形状的方向由{111}飞机出现在蚀刻(a)在Si{100} < 110 >方向表面(b) < 112 >和< 110 >方向如果{110}面。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/2" data-track-dest="link:Figure2 Full size image" aria-label="Full size image figure 2" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-3" data-title="Figure 3"> <figure> <figcaption> <b id="Fig3" class="c-article-section__figure-caption" data-test="figure-caption-text">图3</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/3" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig3_HTML.gif?as=webp"> <img aria-describedby="Fig3" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig3_HTML.gif" alt="图3gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-3-desc"> <p><b>蚀刻的示意图表示配置文件中使用不同形状的面具几何图形(a) (b)和{100}{110}硅片。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/3" data-track-dest="link:Figure3 Full size image" aria-label="Full size image figure 3" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>在本文中,我们回顾了凸角的加工方法在{100}和{110}硅片使用硅微加工大部分基于各向异性湿法化学腐蚀。本文的目的是成为一个独立的指南了解主要原因削弱,凸角,保护的优缺点在硅基MEMS制造削弱,等等。我们已经讨论的问题”,使用什么样的结构和点需要考虑选择腐蚀剂的类型”。</gydF4y2Bap> </div> </div> </section> <section data-title="Difference between etch rate, underetching and undercutting"> <div class="c-article-section" id="Sec2-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec2">不同腐蚀率、钻蚀和削弱</gydF4y2Bah2> <div class="c-article-section__content" id="Sec2-content"> <p>为了选择一个蚀刻剂湿硅各向异性腐蚀,腐蚀率等各种参数各向异性,处理,腐蚀选择性在其他材料(特别是用屏蔽材料),CMOS兼容,削弱等。腐蚀率和削弱主要是用来确定腐蚀时间和蚀刻的结构。蚀刻率是厚度的测量单位时间内删除。它是沿着垂直于表面方向测量蚀刻。晶面的腐蚀速率{hkl}(即R<gydF4y2Basub>{hkl}</gydF4y2Basub>)可以表达如下关系:</gydF4y2Bap> <div id="Equ1" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">左R $ $ {} _ {\ \ {hkl \右\}}= \压裂{d_{\左\ {hkl \右\}}}{t} $ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (1)</dgydF4y2Baiv> </div> <p>在哪里<gydF4y2Bai>d</gydF4y2Bai><sub>{<gydF4y2Bai>hkl</gydF4y2Bai>}</gydF4y2Basub>和<gydF4y2Bai>t</gydF4y2Bai>是腐蚀深度测量垂直于{hkl}飞机和腐蚀时间,分别。</gydF4y2Bap> <p>蚀刻率是一个非常有用的参数各向异性蚀刻剂是用来估计其他参数如吞吐量、各向异性比值两架飞机(尤其是在{100}、{110}和{111}面),削弱了,等。不同晶体的绝对和相对腐蚀率飞机通常是强腐蚀剂的函数类型、浓度和蚀刻温度。此外,腐蚀率显著影响杂质(或添加剂)的腐蚀剂。低浓度的异丙醇在KOH (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 33" title="33gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e764">33</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 129" title="129年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e767">129年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 133" title="133年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e770">133年</一个>)和一个很小的浓度的表面活性剂(如0.1% v / v)在TMAH [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 134" title="134年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e773">134年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 147" title="147年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e776">147年</一个>)确保显著减少在{110}的腐蚀率及其附近的飞机(或飞机之间的{110}和{111}面{441}、{331},{221},等等)。最近,表面活性剂添加KOH的特点是改变腐蚀各向异性和蚀刻表面形态<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 148" title="148年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e780">148年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 149" title="149年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e783">149年</一个>]。蚀刻率的原则取向(即,{100},{110}和{111})可以很容易地确定使用{100}、{110}和{111}硅片市场上常见的。为了获得晶体取向上的详细数据依赖的腐蚀速度,一个车轮结构(一系列的狭窄和长面具彼此打开小角度旋转的中心),如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">4</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 25" title="25gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e789">25</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 150" title="150年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e792">150年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 154" title="154年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e795">154年</一个>)或硅半球如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">5</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 29" title="29日gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e802">29日</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 34" title="34gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e805">34</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 37" title="37gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e808">37</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 38" title="38gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e811">38</一个>是就业。马车轮结构的腐蚀率有限数量的晶体飞机,而硅半球提供所有可能的晶体飞机腐蚀率数据呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">5</一个>。最广泛的应用模式是知道货车车轮横向腐蚀速率和晶体的方向之间的关系在不同取向的表面(例如,{100},{110})。随着Si{111}面各向异性湿化学腐蚀,腐蚀率最低的方向含有{111}飞机(例如< 110 >和< 112 >)展览最小横向腐蚀呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">4</一个>。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-4" data-title="Figure 4"> <figure> <figcaption> <b id="Fig4" class="c-article-section__figure-caption" data-test="figure-caption-text">图4</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/4" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig4_HTML.gif?as=webp"> <img aria-describedby="Fig4" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig4_HTML.gif" alt="图4gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-4-desc"> <p><b>横向钻蚀率的函数图的方向在硅片使用车轮结构(蚀刻剂:50% KOH在78°C)。</gydF4y2Bab>这些模式提供相对腐蚀率而不是绝对腐蚀率。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/4" data-track-dest="link:Figure4 Full size image" aria-label="Full size image figure 4" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-5" data-title="Figure 5"> <figure> <figcaption> <b id="Fig5" class="c-article-section__figure-caption" data-test="figure-caption-text">图5</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/5" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig5_HTML.gif?as=webp"> <img aria-describedby="Fig5" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig5_HTML.gif" alt="图5gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-5-desc"> <p><b>比较的轮廓模式KOH腐蚀率和TMAH解决方案获得了使用硅半球</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 34" title="34gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e856">34</一个>]<gydF4y2Bab>。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/5" data-track-dest="link:Figure5 Full size image" aria-label="Full size image figure 5" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>的<gydF4y2Bai>削弱了</gydF4y2Bai>和<gydF4y2Bai>钻蚀</gydF4y2Bai>是横向腐蚀发生在屏蔽层。大多数情况下,这句话“削弱”和“钻蚀”交替使用。在文献[<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e880">1</一个>),钻蚀是专门用于定义下的蚀刻掩模边缘不包含挤压/凸角。这类型的钻蚀发生的偏差面具边缘或/和由于有限的蚀刻的{111}的飞机。如果面具模式包括凸角,在凸角称为削弱钻蚀。以后,主要是削弱词用于横向腐蚀在任何类型的面具边缘和角落。{100}的晶片,严重削弱了发生在边缘对齐以及非< 110 >方向如果使用一个蚀刻剂没有任何添加剂(即纯KOH或TMAH)。为了制造控制维度的正方形/长方形腔在{100}硅晶圆,正方形/长方形的面具开放沿< 110 >方向一致的面具边缘与这些方向表现出最低削弱由于{111}飞机的出现。如果双方从< 110 >方向略有偏差,削弱了从边缘开始导致腔的尺寸大于需求,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>。</gydF4y2Bap> <p>图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">6</一个>说明了削弱的面具边缘沿< 100 >方向保持一致。在大幅削弱凸角在{100}和{110}面数据所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">7</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">8</一个>,分别。摘要尖凸,凹角总是提到角落有界只有{111}的飞机。由于削弱,任意形状的面具开放在{100}晶片足够的时间后获得一个正方形形状的空腔(或延长时间)湿蚀刻如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>(a),腔的侧壁是最慢的{111}的飞机。的{110}面,除了平行四边形结构形成的< 112 >和< 110 >方向,任何类型的面具开放成为一个多边形形状腔后足够长的蚀刻时间如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>(b)。最后的形状和大小可以确定使用蚀刻参数和三角关系。削弱长度的比率(<gydF4y2Bai>l</gydF4y2Bai>)蚀刻深度(<gydF4y2Bai>d</gydF4y2Bai>)被定义为<gydF4y2Bai>削弱了比</gydF4y2Bai>(U<gydF4y2Basub><i>r</gydF4y2Bai></sub>=<gydF4y2Bai>l</gydF4y2Bai>/<gydF4y2Bai>d</gydF4y2Bai>)。这个评论文章主要集中在硅基MEMS的凸角的作用。因此,为大幅削弱的问题是解决凸角。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-6" data-title="Figure 6"> <figure> <figcaption> <b id="Fig6" class="c-article-section__figure-caption" data-test="figure-caption-text">图6</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/6" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig6_HTML.gif?as=webp"> <img aria-describedby="Fig6" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig6_HTML.gif" alt="图6gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-6-desc"> <p><b>原理图与SEM图片说明削弱和腐蚀。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/6" data-track-dest="link:Figure6 Full size image" aria-label="Full size image figure 6" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-7" data-title="Figure 7"> <figure> <figcaption> <b id="Fig7" class="c-article-section__figure-caption" data-test="figure-caption-text">图7</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/7" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig7_HTML.gif?as=webp"> <img aria-describedby="Fig7" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig7_HTML.gif" alt="图7gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-7-desc"> <p><b>削弱的凸角掩模图案是{100}晶片。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/7" data-track-dest="link:Figure7 Full size image" aria-label="Full size image figure 7" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-8" data-title="Figure 8"> <figure> <figcaption> <b id="Fig8" class="c-article-section__figure-caption" data-test="figure-caption-text">图8</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/8" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig8_HTML.gif?as=webp"> <img aria-describedby="Fig8" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig8_HTML.gif" alt="图8gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-8-desc"> <p><b>在面具的凸角模式削弱了{110}硅片在25 wt % TMAH和34 wt % KOH</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 116" title="116年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e985">116年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e988">128年</一个>]<gydF4y2Bab>。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/8" data-track-dest="link:Figure8 Full size image" aria-label="Full size image figure 8" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>对齐的面具边缘沿着晶体方向在晶片表面在控制中起着重要作用的形状和大小蚀刻概要文件。为了使面具模式与晶片表面的结晶方向,主要平面通常被用作参考。在这种情况下,任何程度的错位在初级平导致面具模式的偏差对晶体的方向。面具的小程度的偏差导致过大的微观结构与晶体边缘方向偏差面具边缘由于削弱了。因此,在使用湿蚀刻硅基MEMS结构的制造,面具的高精度校准模式晶体取向是可取的,以控制装配式结构的维度。几项研究已经进行了面具的精确对齐模式对晶体方向在{110}和{100}硅片(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 155" title="155年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1006">155年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 160" title="160年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1009">160年</一个>]。所有这些技术都是基于掩模的发展模式来创建pre-etched模式识别的结晶方向,例如,在{100}< 110 >方向的晶片表面。</gydF4y2Bap> </div> </div> </section> <section data-title="Advantages and disadvantages of corner undercutting"> <div class="c-article-section" id="Sec3-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec3">削弱了优点和缺点的角落</gydF4y2Bah2> <div class="c-article-section__content" id="Sec3-content"> <p>湿批量制造的微型机械结构,削弱了在凸角起着重要的作用。它有自己的优点和缺点在制造过程中。暂停/独立实现的微观结构的材料,如p<gydF4y2Basup>+</gydF4y2Basup>如果,SiO<gydF4y2Basub>2</gydF4y2Basub>,如果<gydF4y2Basub>3</gydF4y2Basub>N<gydF4y2Basub>4,</gydF4y2Basub>等等,硅结构组件需要被删除(下<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1028">1</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 5" title="5gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1032">5</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 10" title="10gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1035">10</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 70" title="70年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1038">70年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 161" title="161年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1041">161年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 163" title="163年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1044">163年</一个>]。如果流程完成只有一侧的晶片,下面的材料只能通过削弱过程(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 70" title="70年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1047">70年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 161" title="161年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1051">161年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 162" title="162年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1054">162年</一个>]。为了减少释放时间尽快削弱是可取的。因此,削弱率高便于悬挂结构的形成。图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">9</一个>说明了应用程序的削弱暂停了悬臂梁的制造。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-9" data-title="Figure 9"> <figure> <figcaption> <b id="Fig9" class="c-article-section__figure-caption" data-test="figure-caption-text">图9</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/9" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig9_HTML.gif?as=webp"> <img aria-describedby="Fig9" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig9_HTML.gif" alt="图9gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-9-desc"> <p><b>原理图与SEM照片代表应用程序的凸角削弱释放的MEMS微结构。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/9" data-track-dest="link:Figure9 Full size image" aria-label="Full size image figure 9" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>在许多情况下,削弱是有害的,因为它扭曲了所需的形状结构如证据质量的加速度计,台面结构,芯片隔离凹槽,弯曲V-grooves等等,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">10</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 1" title="1gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1088">1</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 2" title="2gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1091">2</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 39" title="39gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1094">39</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 57" title="57gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1097">57</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 70" title="70年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1101">70年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 92" title="92年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1104">92年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 95" title="95年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1107">95年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 118" title="118年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1110">118年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1113">120年</一个>]。因此,削弱是制造不必要的这些类型的微观结构是高度期待通过某种方法来消除这个问题。考虑到削弱的优缺点,设计掩模图案时必须特别注意。几种方法用来规避削弱的问题在本文中进行了综述。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-10" data-title="Figure 10"> <figure> <figcaption> <b id="Fig10" class="c-article-section__figure-caption" data-test="figure-caption-text">图10</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/10" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig10_HTML.gif?as=webp"> <img aria-describedby="Fig10" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig10_HTML.gif" alt="图10gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-10-desc"> <p><b>微观结构的几个例子硅片削弱在凸角是绝对不可取的。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/10" data-track-dest="link:Figure10 Full size image" aria-label="Full size image figure 10" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> </div> </div> </section> <section data-title="Why does undercutting starts at convex corners?"> <div class="c-article-section" id="Sec4-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec4">为什么削弱在凸角开始吗?</gydF4y2Bah2> <div class="c-article-section__content" id="Sec4-content"> <p>KOH的腐蚀特征与不同的酒精添加剂呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">11</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 133" title="133年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1149">133年</一个>]。纯KOH的削弱是相当高的,而在酒显著抑制的解决方案。TMAH而言,表面活性剂最佳添加剂最小化削弱在所有类型的角落和边缘如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 134" title="134年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1155">134年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1158">146年</一个>]。在纯碱液,凸角遇到严重削弱,虽然没有削弱观察到凹角如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">9</一个>。现在的问题是,为什么在凸角削弱开始而不是凹角,即使这两种类型的角落是由{111}的交集的飞机。此外,为什么削弱抑制蚀刻完成后在酒KOH(或surfactant-added TMAH)如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">11</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>。几个模型已经开发出来解释背后的机制削弱在凸角(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 80" title="80年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1171">80年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 86" title="86年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1174">86年</一个>]。大多数的模型讨论如果{100}晶圆定位被广泛应用于精密加工。一般来说,他们解释,削弱由于发生的外观腐蚀率高的飞机在腐蚀过程中(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 80" title="80年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1177">80年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 85" title="85年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1181">85年</一个>]。原子论的规模,凸角公开协调原子迁移率高的低,因此诱导快速腐蚀的出现飞机倾斜的面或凸凹变化(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 164" title="164年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1184">164年</一个>]。魏董<gydF4y2Bai>et al。</gydF4y2Bai>{110}面解释了削弱机制通过比较打破债券(即晃来晃去的债券)的密度在凸角和{111}面<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 86" title="86年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1190">86年</一个>]。打破债券在凸角的硅原子密度高于{111}的飞机。这一事实导致削弱在凸角的去除率原子属于凸角高于原子与{111}的飞机。硅原子的凹角不包含任何打破债券,因此凹角不是扭曲的形状。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-11" data-title="Figure 11"> <figure> <figcaption> <b id="Fig11" class="c-article-section__figure-caption" data-test="figure-caption-text">图11</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/11" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig11_HTML.gif?as=webp"> <img aria-describedby="Fig11" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig11_HTML.gif" alt="图11gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-11-desc"> <p><b>KOH腐蚀特性的解决方案在80°C和不同酒精添加剂</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 133" title="133年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1206">133年</一个>]<gydF4y2Bab>。</gydF4y2Bab>2002年与爱思唯尔的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/11" data-track-dest="link:Figure11 Full size image" aria-label="Full size image figure 11" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-12" data-title="Figure 12"> <figure> <figcaption> <b id="Fig12" class="c-article-section__figure-caption" data-test="figure-caption-text">图12</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/12" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig12_HTML.gif?as=webp"> <img aria-describedby="Fig12" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig12_HTML.gif" alt="图12gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-12-desc"> <p><b>腐蚀特征的纯和表面活性剂(Triton x - 100)添加25 wt % TMAH:(一)——(c) 3 d分配和2 d的情节腐蚀率</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 38" title="38gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1234">38</一个>]<gydF4y2Bab>;(d)蚀刻概要的凸角(e)削弱比(</gydF4y2Bab><b><i>l</gydF4y2Bai></b><b>/ d)在不同的温度下(f)微加工Si{100}的字母字母使用纯TMAH (i)和(ii) TMAH +卫。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/12" data-track-dest="link:Figure12 Full size image" aria-label="Full size image figure 12" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>最近,开发一个简单的模型来描述的腐蚀特征凹凸角落在{100}和{110}面在各种潮湿的各向异性蚀刻剂(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 79" title="79年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1258">79年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 87" title="87年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1261">87年</一个>]。这个模型是基于凸边的切平面的腐蚀行为和腐蚀过程中悬挂键的作用。有无数的飞机可以通过凸台面边缘结构。尽管无数的飞机可以通过这条边,硅原子的凸边只完全属于切平面的边缘,很简单可以注意到图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">13</一个>。切平面的方向取决于凸角的角度(即急性、权利和迟钝)。锐角和钝角的切平面凸角是{100}和{110},分别。在直角的凸角的情况下在{100}薄片,切平面的方向是{110}。在各向异性蚀刻剂蚀刻率的{110}和{100}面高于的{111}面呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">5</一个>。因此,削弱始于凸边凸脊的切平面包含原子表现出更高的腐蚀速率比形成{111}面角。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-13" data-title="Figure 13"> <figure> <figcaption> <b id="Fig13" class="c-article-section__figure-caption" data-test="figure-caption-text">图13</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/13" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig13_HTML.gif?as=webp"> <img aria-describedby="Fig13" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig13_HTML.gif" alt="图13gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-13-desc"> <p><b>凹凸的示意图表示角落在{100}和{110}晶片。</gydF4y2Bab>凹角的特写镜头展示硅原子的{111}面与一个悬空键,而原子属于边缘的凹角不包含任何悬空键。凸角的特写镜头显示切平面。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/13" data-track-dest="link:Figure13 Full size image" aria-label="Full size image figure 13" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>提出了图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>在角落凸显著降低,削弱surfactant-added TMAH。如果{100}的腐蚀速率是几乎一样的纯净和surfactant-added 25 wt % TMAH(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>(c),{110}的腐蚀率及其附近的飞机下降到一个相当低的水平时,少量的表面活性剂添加到腐蚀剂。蚀刻率的变化背后的主要原因是由于蚀刻过程中表面活性剂分子的取向相关的吸附。已经证实通过傅里叶变换红外(FTIR)和Ellipsometric研究的最大吸附是{111}面{110}和{100}面(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 135" title="135年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1301">135年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 137" title="137年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1304">137年</一个>]。{100}的腐蚀率几乎不受影响,因为表面活性剂分子的层{100}面不能保护的表面蚀刻剂由于其较低的吸附能力。Si的{110},显著减少腐蚀率表明,吸附层表面活性剂分子足以保护表面免受腐蚀剂。自切平面上的凸角,{110}{100}面,表面活性剂分子形成一个致密层凸角如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">14</一个>。这种致密层抑制腐蚀剂在拐角处与硅原子发生化学反应,导致戏剧性的减少削弱。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-14" data-title="Figure 14"> <figure> <figcaption> <b id="Fig14" class="c-article-section__figure-caption" data-test="figure-caption-text">图14</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/14" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig14_HTML.gif?as=webp"> <img aria-describedby="Fig14" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig14_HTML.gif" alt="图14gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-14-desc"> <p><b>表面活性剂吸附在硅原子的示意图表示的凸角,属于{110}的飞机,在surfactant-added TMAH溶液腐蚀过程。</gydF4y2Bab>表面活性剂分子的致密层保护的凸角腐蚀剂,导致减少削弱。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/14" data-track-dest="link:Figure14 Full size image" aria-label="Full size image figure 14" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>在凹角的情况下,不论其形状,凹脊由原子没有晃来晃去的债券(或不满意债券)即所有债券的凹面原子与相邻的原子。由于这一事实,没有削弱启动定义的凹角和他们仍然完好无损,坚决由{111}平面的交点不管蚀刻时间、蚀刻深度、蚀刻剂浓度、腐蚀温度示意图如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">13</一个>。</gydF4y2Bap> </div> </div> </section> <section data-title="Etched profile of undercut convex corners"> <div class="c-article-section" id="Sec5-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec5">蚀刻的削弱凸角</gydF4y2Bah2> <div class="c-article-section__content" id="Sec5-content"> <p>削弱的起始凸角使其他类型的腐蚀率高的飞机的方向取决于类型的晶片表面。蚀刻角落的轮廓由横向分析削弱腐蚀率在不同的方向所估计的蚀刻马车轮结构如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">4</一个>。横向腐蚀率(或钻蚀)在不同晶体在平面方向取决于类型的腐蚀剂,浓度和温度<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 4" title="4gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1350">4</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 25" title="25gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1353">25</一个>]。因此削弱的数量和几何的发展为不同的蚀刻剂蚀刻前通常是不同的。最后腐蚀削弱前凸角是由十字路口的方向平行于最大横向腐蚀速率方向最接近边缘形成凸角如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">15</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">16</一个>{100}和{110}面,分别。这将导致不同的蚀刻剖面在不同类型的角落可以看到数据<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">7</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">8</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">15</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">16</一个>。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-15" data-title="Figure 15"> <figure> <figcaption> <b id="Fig15" class="c-article-section__figure-caption" data-test="figure-caption-text">图15</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/15" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig15_HTML.gif?as=webp"> <img aria-describedby="Fig15" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig15_HTML.gif" alt="图15gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-15-desc"> <p><b>使用横向钻蚀图示意图表示的角落削弱。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/15" data-track-dest="link:Figure15 Full size image" aria-label="Full size image figure 15" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-16" data-title="Figure 16"> <figure> <figcaption> <b id="Fig16" class="c-article-section__figure-caption" data-test="figure-caption-text">图16</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/16" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig16_HTML.gif?as=webp"> <img aria-describedby="Fig16" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig16_HTML.gif" alt="图16gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-16-desc"> <p><b>测定硅蚀刻前凸角的{110}使用横向削弱图。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/16" data-track-dest="link:Figure16 Full size image" aria-label="Full size image figure 16" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>胎侧的蚀刻轮廓出现在蒙面边缘可以很容易地确定使用Wulff-Jaccodine方法(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 4" title="4gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1422">4</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 38" title="38gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1425">38</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 165" title="165年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1428">165年</一个>]。在这种方法中,蚀刻概要文件是由蚀刻率的分布估计向量存在的飞机属于面具边缘的蚀刻侧壁概要文件将会出现。面具边缘(或线)被称为飞机的晶带轴穿过它。区域是一组相互交叉的{hkl}飞机沿(或平行)一个共同的方向(或轴)[开始]对一个给定的水晶如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">17</一个>。交叉的线[开始]称为晶带轴。飞机的腐蚀率可以由任何晶带轴半球的腐蚀率数据<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 34" title="34gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1434">34</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 38" title="38gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1438">38</一个>]。蚀刻的侧壁剖面模式掩蔽边缘的最小包络的相交线垂直于不同飞机的腐蚀率向量属于面具边缘(晶带轴)在数字<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">18</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">19</一个>。飞机出现在面具边缘是最低的腐蚀速率飞机水平面和垂直面之间的边缘。同样削弱结构的蚀刻轮廓估计。在这种情况下,胎侧是最小的飞机最大横向腐蚀速率钻蚀速率的方向。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-17" data-title="Figure 17"> <figure> <figcaption> <b id="Fig17" class="c-article-section__figure-caption" data-test="figure-caption-text">图17</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/17" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig17_HTML.gif?as=webp"> <img aria-describedby="Fig17" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig17_HTML.gif" alt="图17gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-17-desc"> <p><b>晶带轴的示意图表示的图和它的飞机和在KOH腐蚀率不同的飞机类型腐蚀剂(a) < 100 >−区和(b) < 110 >−区,利用预测使用Wulff-Jaccodine方法蚀刻轮廓的形状</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 4" title="4gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1460">4</一个>]<gydF4y2Bab>。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/17" data-track-dest="link:Figure17 Full size image" aria-label="Full size image figure 17" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-18" data-title="Figure 18"> <figure> <figcaption> <b id="Fig18" class="c-article-section__figure-caption" data-test="figure-caption-text">图18</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/18" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig18_HTML.gif?as=webp"> <img aria-describedby="Fig18" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig18_HTML.gif" alt="图18gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-18-desc"> <p><b>示意图展示Wulff-Jaccodine方法估计面具边缘对齐的蚀刻概要文件在< 110 >和< 100 >方向如果{100}面。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/18" data-track-dest="link:Figure18 Full size image" aria-label="Full size image figure 18" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-19" data-title="Figure 19"> <figure> <figcaption> <b id="Fig19" class="c-article-section__figure-caption" data-test="figure-caption-text">图19</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/19" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig19_HTML.gif?as=webp"> <img aria-describedby="Fig19" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig19_HTML.gif" alt="图19gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-19-desc"> <p><b>示意图说明估计的侧壁概要文件在< 110 >面具边缘使用Wulff-Jaccodine方法如果{110}面。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/19" data-track-dest="link:Figure19 Full size image" aria-label="Full size image figure 19" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>方面出现在凸角的方向主要取决于类型的腐蚀剂,浓度和添加剂(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 79" title="79年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1522">79年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 87" title="87年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1525">87年</一个>]。蚀刻时间和温度也影响斜平面的形状和方向。一般来说,这些方面的{100}面通常是{311},{211},{331},{411},{212},{772},等等。<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 80" title="80年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1528">80年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 85" title="85年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1531">85年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 90" title="90年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1534">90年</一个>]。削弱了飞机的方向影响蚀刻剂的添加剂,例如,IPA在KOH(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">11</一个>在TMAH)和表面活性剂(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>)。然而斜平面的方向削弱角落取决于蚀刻剂的选择及其浓度,不同的研究小组报道不同的指数相同的腐蚀剂。比如在KOH溶液中,凸角的斜面飞机报道<gydF4y2Bai>,</gydF4y2Bai>Shikida<gydF4y2Bai>et al。</gydF4y2Bai>常,简<gydF4y2Bai>et al。</gydF4y2Bai>和迈耶<gydF4y2Bai>et al。</gydF4y2Bai>{311}、{772}和{411},分别为(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 83" title="83年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1557">83年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 84" title="84年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1560">84年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 92" title="92年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1563">92年</一个>]。因此,存在一些分歧,但是在文献中关于飞机的确切方向出现在腐蚀过程中凸角。Shikida<gydF4y2Bai>et al。</gydF4y2Bai>解释说,新兴的快速腐蚀飞机、凸角位于鞍点的腐蚀速率图(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 83" title="83年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1569">83年</一个>]。鞍点的位置取决于蚀刻蚀刻率图参数,例如,它坐落在{311}面34 wt % KOH。{110}的晶片,蚀刻前飞机削弱凸角的台地结构形成的< 112 >方向估计金姆和曹KOH的{311}和{771}面为锐角和钝角,分别为(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 116" title="116年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1572">116年</一个>]。坡角(<gydF4y2Bai>α</gydF4y2Bai>)(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">15</一个>)不同structure-to-structure相同的样品(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 80" title="80年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1582">80年</一个>]。因此坡面指数也将改变。因此,削弱飞机的腐蚀剂的索引不能被完全定义。原则上,削弱发生由于接触低协调原子迁移率高的,但是削弱角落的方面不腐蚀速率最高的飞机。相反,他们是当地最大腐蚀速率的飞机,谎言的鞍点附近的腐蚀速率等值线图(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 166" title="166年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1585">166年</一个>]。在surfactant-added TMAH IPA-added KOH,{110}的腐蚀率及其附近的飞机被抑制相当低的水平。由于这个因素,削弱了在挤压,弯曲和非{100}< 110 >的边缘表面显著降低(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 136" title="136年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1588">136年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1591">146年</一个>]。这里可能强调,surfactant-added TMAH不适合微观结构在{110}的制造晶片的腐蚀速率{110}取向非常低,提出了图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>。作为下一节将讨论,斜切的飞机不是显著重要的知识制作凸角保护。削弱比(<gydF4y2Bai>l / d</gydF4y2Bai>)和坡角(<gydF4y2Bai>α</gydF4y2Bai>),如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">15</一个>,主要是要求开发一种方法实现形状规整的凸角。</gydF4y2Bap> </div> </div> </section> <section data-title="Fabrication methods of convex corners"> <div class="c-article-section" id="Sec6-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec6">加工凸角的方法</gydF4y2Bah2> <div class="c-article-section__content" id="Sec6-content"> <p>大量的研究一直致力于实现凸角在Si{100}面这个方向是最广泛应用于MEMS制造(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 24" title="24gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1616">24</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 88" title="88年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1619">88年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 114" title="114年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1622">114年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 118" title="118年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1625">118年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 126" title="126年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1628">126年</一个>]。然而,如果报告更少的{110},因为它只对特定的应用程序(使用<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 115" title="115年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1632">115年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 117" title="117年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1635">117年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 127" title="127年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1638">127年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1641">128年</一个>]。本文综述了凸角的制造这两种类型的方向(即Si Si{110}和{100})。许多技术已经开发形成的凸角使用湿的各向异性腐蚀保护。每个制造技术都有自己的优点和缺点的过程的灵活性,时间,成本和质量的角落。这些方法将在以后的章节中描述。</gydF4y2Bap> <h3 class="c-article__sub-heading" id="Sec7">角补偿技术</gydF4y2Bah3> <p>为了实现明确的凸角,角补偿是一个最受欢迎的方法。这种方法是基于凸角的增加额外的几何为了延缓腐蚀,这样没有削弱可以开始在拐角处。角补偿技术在湿的各向异性腐蚀是由大量的出版物在过去(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 24" title="24gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1651">24</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 88" title="88年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1654">88年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 126" title="126年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1657">126年</一个>]。大多数的研究进行了纯和IPA-added KOH的解决方案。有些是进行电子数据处理(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 89" title="89年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1660">89年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 90" title="90年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1663">90年</一个>]和TMAH [<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 108" title="108年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1667">108年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1670">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 122" title="122年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1673">122年</一个>]。各种类型的补偿模式用于实现凸角在{100}和{110}硅片数据所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">20.</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">21</一个>,分别。这些结构的设计方法在后续部分中阐述了。补偿几何图形的大小强烈依赖于蚀刻深度和腐蚀剂的腐蚀特征。各种参数必须是已知的分析和准确的设计补偿几何:蚀刻率的晶片表面平面(即R<gydF4y2Basub>{100}</gydF4y2Basub>或者R<gydF4y2Basub>{110}</gydF4y2Basub>);腐蚀深度(<gydF4y2Bai>d</gydF4y2Bai>);削弱长度(<gydF4y2Bai>l</gydF4y2Bai>);坡角(<gydF4y2Bai>α</gydF4y2Bai>)即一个夹角最大横向削弱和面具边缘的方向;削弱比率:(U<gydF4y2Basub>r</gydF4y2Basub>=<gydF4y2Bai>l / d</gydF4y2Bai>)。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-20" data-title="Figure 20"> <figure> <figcaption> <b id="Fig20" class="c-article-section__figure-caption" data-test="figure-caption-text">图20</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/20" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig20_HTML.gif?as=webp"> <img aria-describedby="Fig20" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig20_HTML.gif" alt="图20gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-20-desc"> <p><b>各种类型的角落用来实现凸角补偿几何图形在Si{100}晶片。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/20" data-track-dest="link:Figure20 Full size image" aria-label="Full size image figure 20" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-21" data-title="Figure 21"> <figure> <figcaption> <b id="Fig21" class="c-article-section__figure-caption" data-test="figure-caption-text">图21</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/21" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig21_HTML.gif?as=webp"> <img aria-describedby="Fig21" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig21_HTML.gif" alt="图21gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-21-desc"> <p><b>不同种类的角落补偿设计用来制造Si{110}晶片上的凸角。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/21" data-track-dest="link:Figure21 Full size image" aria-label="Full size image figure 21" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <h4 class="c-article__sub-heading c-article__sub-heading--small" id="Sec8">角补偿几何图形是{100}晶片</gydF4y2Bah4> <p>角补偿几何的设计方法是对所有类型的各向异性蚀刻剂。尺寸和形状分析了晶体的相对腐蚀率的飞机。然而不同的补偿几何图形,呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">20.</一个>提出了四种类型的设计,即三角形,正方形,乐队< 110 >和< 100 >取向梁的基本结构。其他形状是这些结构的衍生品。</gydF4y2Bap> <p><b>(我)三角形:</gydF4y2Bab>三角形的几何形状,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">22</一个>,是一个简单的补偿设计确定其形状和尺寸<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 90" title="90年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1765">90年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 91" title="91年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1768">91年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e1771">120年</一个>]。为了计算的尺寸补偿三角形,削弱长度沿< 110 >方向(OP, OC,或<gydF4y2Bai>l</gydF4y2Bai>在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">22</一个>)和坡角α=<gydF4y2Baspan class="stix">∠</gydF4y2Baspan>OPB =<gydF4y2Baspan class="stix">∠</gydF4y2Baspan>台籍干部=<gydF4y2Baspan class="stix">∠</gydF4y2Baspan>APO =<gydF4y2Baspan class="stix">∠</gydF4y2Baspan>配电网是必要的。行PB和CB代表的交集与晶片表面的刨边飞机如果没有补偿模式。三角形的两边美联社和AC选择为了配合<<gydF4y2Bai>lm</gydF4y2Bai>0 >家庭的行对应PB和CB。换句话说,三角形的两边是横向腐蚀速率最高的方向在{100}面说明使用红色图中心的横向腐蚀速率相匹配的凸角。补偿三角形的边的长度(即AP或交流)可以确定使用正弦定律(或正弦规则)如下:</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-22" data-title="Figure 22"> <figure> <figcaption> <b id="Fig22" class="c-article-section__figure-caption" data-test="figure-caption-text">图22</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/22" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig22_HTML.gif?as=webp"> <img aria-describedby="Fig22" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig22_HTML.gif" alt="图22gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-22-desc"> <p><b>三角形的示意图表示补偿几何。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/22" data-track-dest="link:Figure22 Full size image" aria-label="Full size image figure 22" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div id="Equ2" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ \压裂{美联社}{\罪135}= \压裂{l}{\罪\离开(\压裂{90 - 2 \α}{2}\右)}\ kern1.25em \ Rightarrow美联社\左(或\ \ mathrm {AC} \右)= \压裂{l} {\ sqrt{2} \罪\离开(45 -α\ \右)}$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (2)</dgydF4y2Baiv> </div> <p>从这个公式很明显,补偿三角形的边的长度取决于削弱长度<gydF4y2Bai>l</gydF4y2Bai>和坡角<gydF4y2Bai>α</gydF4y2Bai>。这个角<gydF4y2Bai>α</gydF4y2Bai>和削弱的比率(<gydF4y2Bai>U</gydF4y2Bai><sub>r</gydF4y2Basub>=<gydF4y2Bai>l</gydF4y2Bai>/<gydF4y2Bai>d</gydF4y2Bai>)取决于类型的腐蚀剂。因此,为了确定补偿三角形的尺寸来制造一个受保护的凸角腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>,长度<gydF4y2Bai>l</gydF4y2Bai>和一个角度<gydF4y2Bai>α</gydF4y2Bai>必须知道的腐蚀剂。的连续消费补偿设计在蚀刻虚线所示。</gydF4y2Bap> <p>台面结构的扫描电镜图片制作40 wt % KOH和25 wt % TMAH使用三角模式如图所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">23</一个>分别(a)和(b)。对于25 wt % TMAH,台面结构形成的凸角顶部有轻微的斜面的一面,而在40 wt % KOH挤压的角落里的是清晰可见。因此,三角补偿几何不确保完整的凸角补偿。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-23" data-title="Figure 23"> <figure> <figcaption> <b id="Fig23" class="c-article-section__figure-caption" data-test="figure-caption-text">图23</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/23" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig23_HTML.gif?as=webp"> <img aria-describedby="Fig23" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig23_HTML.gif" alt="图23gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-23-desc"> <p><b>台面结构的扫描电镜照片伪造40 wt % KOH (a)和(b) 25 wt % TMAH在70°C使用三角形补偿几何图所示</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <p>在几项研究中,发现25%的TMAH是最有利的选择最小化大幅削弱的凸角,实现平滑的表面光洁度和合理的腐蚀率如果{100}通过添加少量的表面活性剂(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 134" title="134年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2000">134年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 137" title="137年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2003">137年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 141" title="141年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2006">141年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 142" title="142年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2009">142年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2012">146年</一个>]。图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">24</一个>显示了连续的扫描电镜图像腐蚀形状的台面结构与三角形的薪酬结构。它可以注意到在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">24</一个>(b)的补偿结构顶部角落已经被消费的一部分。然而,凸角没有获得所需的形状很多肿块质量是在边缘的角落。尽管进一步腐蚀挤压结构,上部角落边的形状扭曲。从这些结果,可以得出结论:三角形几何不能提供大幅凸角surfactant-added TMAH溶液。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-24" data-title="Figure 24"> <figure> <figcaption> <b id="Fig24" class="c-article-section__figure-caption" data-test="figure-caption-text">图24</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/24" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig24_HTML.gif?as=webp"> <img aria-describedby="Fig24" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig24_HTML.gif" alt="图24gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-24-desc"> <p><b>按顺序蚀刻形状与三角形补偿台面结构设计在表面活性剂添加25 wt % TMAH</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2035">120年</一个>]<gydF4y2Bab>。</gydF4y2Bab>2009年与爱思唯尔的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/24" data-track-dest="link:Figure24 Full size image" aria-label="Full size image figure 24" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p><b>(2)广场:</gydF4y2Bab>三角形几何需要更多空间的长边。在这个方案中,正方形的设计提出了减少空间需求适合在小空间目标角相比,三角形,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">25</一个>。在这种情况下,一个正方形的中心正值凸角的顶点是用于时间延迟腐蚀保护凸角(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 24" title="24gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2059">24</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 88" title="88年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2062">88年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 89" title="89年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2065">89年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 91" title="91年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2069">91年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2072">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 122" title="122年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2075">122年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 125" title="125年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2078">125年</一个>]。它可以注意到从图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">25</一个>广场的形状补偿设计包含三个凸角(m, n和T),因此这种结构被削弱,从这些角落。为了确定补偿几何的边长(<gydF4y2Bai>一个</gydF4y2Bai>)腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>,一个简单的公式可以使用几何关系推导。计算是基于斜边所需的时间<gydF4y2Baspan class="mathjax-tex">\(左\[\眉题{l} m0 \右]\)</gydF4y2Baspan>(或<<gydF4y2Bai>lm</gydF4y2Bai>0 >)进化从m点到点O如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">25</一个>。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-25" data-title="Figure 25"> <figure> <figcaption> <b id="Fig25" class="c-article-section__figure-caption" data-test="figure-caption-text">图25</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/25" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig25_HTML.gif?as=webp"> <img aria-describedby="Fig25" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig25_HTML.gif" alt="图25gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-25-desc"> <p><b>广场的形状补偿设计的示意图。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/25" data-track-dest="link:Figure25 Full size image" aria-label="Full size image figure 25" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>的垂直距离<gydF4y2Bai>r</gydF4y2Bai>从一个点(−<gydF4y2Bai>一个</gydF4y2Bai>/ 2,<gydF4y2Bai>一个</gydF4y2Bai>/ 2)平行的一条线操作系统<gydF4y2Baspan class="mathjax-tex">\(左\[\眉题{l} m0 \右]\)</gydF4y2Baspan>(或<<gydF4y2Bai>lm</gydF4y2Bai>0 >)和通过“O”(<gydF4y2Bai>例如,y = tanα.x</gydF4y2Bai>)</gydF4y2Bap> <div id="Equ3" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ \ mathrm {r} = \压裂{\压裂{一}{2}- \ tan \α。\离开(- \压裂{一}{2}\右)}{\√6 {1 + {\ tan} ^ 2 \α}}\ kern0.75em \ Rightarrow \ mathrm {r} = 0.5 \离开α(罪\ cosα+ \ \ \ \右)$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (3)</dgydF4y2Baiv> </div> <p>之间的关系<gydF4y2Bai>r</gydF4y2Bai>和<gydF4y2Bai>l</gydF4y2Bai>是<gydF4y2Baspan class="mathjax-tex">r \ (l = \压裂{}{α罪\ \}\)</gydF4y2Baspan></p> <p>使用这两个方程,我们可以得到一个关系<gydF4y2Bai>一个右</gydF4y2Bai>和削弱比率(U<gydF4y2Basub>r</gydF4y2Basub>=<gydF4y2Bai>l / d</gydF4y2Bai>)</gydF4y2Bap> <div id="Equ4" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ ${你}_r = \压裂{l} {d} \ kern1.75em \ Rightarrow d = \压裂{0.5 \离开α(罪\ cosα+ \ \ \ \右)}{U_r \罪\α}$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (4)</dgydF4y2Baiv> </div> <p>台面结构组装在40 wt % KOH和25 wt % TMAH使用方提出了补偿几何图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">26</一个>分别(a)和(b)。在这两种情况下,角落的形状是受损,可以观察到显著的斜面。台面结构的扫描电镜图像蚀刻在surfactant-added 25 wt %针对不同期限的TMAH如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">27</一个>。在这种情况下,制作凸角形状规整。如果蚀刻完成直到补偿几何消耗,大量挤压硅仍在角落,可以看到图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">27</一个>(b)。类似于三角形补偿,进一步腐蚀去除额外的质量在凸角改变所需的形状如图的角落<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">27</一个>(c)。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-26" data-title="Figure 26"> <figure> <figcaption> <b id="Fig26" class="c-article-section__figure-caption" data-test="figure-caption-text">图26</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/26" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig26_HTML.gif?as=webp"> <img aria-describedby="Fig26" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig26_HTML.gif" alt="图26gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-26-desc"> <p><b>台面结构的扫描电镜照片伪造40 wt % KOH (a)和(b)在70°C使用广场25 wt % TMAH补偿几何形状如图</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-27" data-title="Figure 27"> <figure> <figcaption> <b id="Fig27" class="c-article-section__figure-caption" data-test="figure-caption-text">图27</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/27" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig27_HTML.gif?as=webp"> <img aria-describedby="Fig27" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig27_HTML.gif" alt="图27gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-27-desc"> <p><b>顺序蚀刻台面结构形状与方形补偿模式在表面活性剂添加25 wt % TMAH</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2523">120年</一个>]<gydF4y2Bab>。</gydF4y2Bab>2009年与爱思唯尔的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/27" data-track-dest="link:Figure27 Full size image" aria-label="Full size image figure 27" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p><b>(3)< 110 >取向梁:</gydF4y2Bab>薪酬结构的设计背后的主要目的是减少空间需求和实现形状规整的凸角。在这种情况下,一个简单的< 110 >取向梁(或矩形)如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">20.</一个>(d)和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>或< 110 >取向的结合梁和广场,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">20.</一个>(e) - (h),添加在凸角,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 89" title="89年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2554">89年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 94" title="94年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2558">94年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 99" title="99年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2561">99年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 110" title="110年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2564">110年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2567">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 126" title="126年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2570">126年</一个>]。进步蚀刻的简单和不对称的< 110 >梁由虚线图所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>。< 110 >的消费补偿梁发生的起始削弱的凸角说明使用横向腐蚀速率图所示红色线。它可以观察到从蚀刻前由虚线表示,< 110 >梁式补偿设计表现出显著的斜面,根据梁的宽度。为了减少斜面,梁的宽度应该尽可能小。刨边还可以最小化使用非对称梁形状,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>(b),让<gydF4y2Bai>W</gydF4y2Bai>和<gydF4y2Bai>l</gydF4y2Bai><sub>< 110 ></gydF4y2Basub>补偿光束的宽度和长度,分别。一个数学这些维度和腐蚀深度之间的关系<gydF4y2Bai>d</gydF4y2Bai>可以使用简单的几何公式用于确定广场补偿几何在前一节。在这种情况下,垂直距离<gydF4y2Bai>r</gydF4y2Bai>计算从B点线OG通过“O”(<gydF4y2Bai>例如,y = cota.x</gydF4y2Bai>)。下面的关系获得了两个不同形状的光束(即对称和非对称):</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-28" data-title="Figure 28"> <figure> <figcaption> <b id="Fig28" class="c-article-section__figure-caption" data-test="figure-caption-text">图28</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/28" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig28_HTML.gif?as=webp"> <img aria-describedby="Fig28" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig28_HTML.gif" alt="图28gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-28-desc"> <p><b>示意图说明< 110 >取向补偿几何。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/28" data-track-dest="link:Figure28 Full size image" aria-label="Full size image figure 28" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(一)</gydF4y2Baspan><p>简单的梁(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>(一))</gydF4y2Bap></li> </ol> <div id="Equ5" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ d = \压裂{0.5 w \因为\α+ {L} _{< 110 >} \罪\α}{{\ mathrm{你}}_ {\ mathrm {r}}}为\ \ kern1em kern0.5em {L} _{< 110 >} \通用电气0.5 w美元美元</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (5)</dgydF4y2Baiv> </div> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(b)</gydF4y2Baspan><p>非对称梁(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>(b))</gydF4y2Bap></li> </ol> <div id="Equ6" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ d = \压裂{W \因为\α+ {L} _{< 110 >} \罪\α}{U_r \罪\α}$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (6)</dgydF4y2Baiv> </div> <p>台面结构的扫描电镜图片的使用不对称的< 110 >梁(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">28</一个>(b))在40 wt % KOH和25% TMAH呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">29日</一个>分别(a)和(b)。从SEM图像很容易注意到的角落是非常糟糕的腐蚀剂。一块质量沿< 110 >方向挤压是清晰可见的结构在25 wt % TMAH实现。因此,这种补偿设计不适合实现尖角在任何一种腐蚀剂。正如我们前面所讨论的,三角形和正方形形状补偿几何图形不适合形成的锐角surfactant-added TMAH。也在这种情况下,它可以很容易地估计,蚀刻使用< 110 >凸角梁的形状也会导致挤压质量在凸角,但沿< 110 >方向。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-29" data-title="Figure 29"> <figure> <figcaption> <b id="Fig29" class="c-article-section__figure-caption" data-test="figure-caption-text">图29</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/29" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig29_HTML.gif?as=webp"> <img aria-describedby="Fig29" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig29_HTML.gif" alt="图29gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-29-desc"> <p><b>台面结构的扫描电镜照片伪造40 wt % KOH (a)和(b) 25 wt % TMAH在70°C使用不对称的< 110 >梁补偿几何图所示</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <p><b>(iv)简单的< 100 >取向梁:</gydF4y2Bab>没有到目前为止讨论的薪酬结构(即三角形,广场,< 110 >−梁)提供了锋利的边缘凸角。在继续努力制造锋利的凸角,提出了一个简单的< 100 >取向梁呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 92" title="92年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2882">92年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 100" title="One hundred.gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2885">One hundred.</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 103" title="103年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2888">103年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 105" title="105年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2892">105年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 108" title="108年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2895">108年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 109" title="109年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2898">109年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2901">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 122" title="122年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2904">122年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 125" title="125年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e2907">125年</一个>]。如虚线所示,梁被削弱发起自由端和横向削弱开始长边的光束。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-30" data-title="Figure 30"> <figure> <figcaption> <b id="Fig30" class="c-article-section__figure-caption" data-test="figure-caption-text">图30</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/30" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig30_HTML.gif?as=webp"> <img aria-describedby="Fig30" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig30_HTML.gif" alt="图30gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-30-desc"> <p><b>< 100 >的示意图表示−导向薪酬模式。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/30" data-track-dest="link:Figure30 Full size image" aria-label="Full size image figure 30" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>< 100 >梁的蚀刻轮廓取决于不同飞机的腐蚀特征出现在< 100 >面具边缘。这些飞机是{100}或{<gydF4y2Bai>ij</gydF4y2Bai>0}如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">31日</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>。预测蚀刻的< 100 >光束,不同条件下基于腐蚀速率比{<gydF4y2Bai>ij</gydF4y2Bai>0}和{100}(即R<gydF4y2Basub>{<gydF4y2Bai>ij</gydF4y2Bai>0}</gydF4y2Basub>/ R<gydF4y2Basub>{100}</gydF4y2Basub>使用图)可以被定义<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">31日</一个>如下:</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-31" data-title="Figure 31"> <figure> <figcaption> <b id="Fig31" class="c-article-section__figure-caption" data-test="figure-caption-text">图31</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/31" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig31_HTML.gif?as=webp"> <img aria-describedby="Fig31" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig31_HTML.gif" alt="图31gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-31-desc"> <p><b>一个正方形面具与< 100 >薪酬模式设计。</gydF4y2Bab>的横截面视图蚀刻的补偿结构用于{曝光条件的分析<gydF4y2Bai>ij</gydF4y2Bai>0}飞机在腐蚀呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/31" data-track-dest="link:Figure31 Full size image" aria-label="Full size image figure 31" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-32" data-title="Figure 32"> <figure> <figcaption> <b id="Fig32" class="c-article-section__figure-caption" data-test="figure-caption-text">图32</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/32" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig32_HTML.gif?as=webp"> <img aria-describedby="Fig32" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig32_HTML.gif" alt="图32gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-32-desc"> <p><b>蚀刻的< 100 >取向光束补偿在{100}晶片表面结构三种不同条件下角θ和腐蚀率</gydF4y2Bab><b><i>R</gydF4y2Bai></b><sub><b>{100}</gydF4y2Bab></sub><b>和</gydF4y2Bab><b><i>R</gydF4y2Bai></b><sub><b>{</gydF4y2Bab><b><i>ij</gydF4y2Bai></b><b>0}</gydF4y2Bab></sub><b>如图</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(一)</gydF4y2Baspan><p>如果<gydF4y2Baspan class="mathjax-tex">\(\压裂{R_{\左\ {ij0 \右\}}}{R_{\左\ {100 \ \}}}\ le sinθ\ \)</gydF4y2Baspan>,只有{<gydF4y2Bai>ij</gydF4y2Bai>0}飞机将在< 100 >开发的边缘</gydF4y2Bap></li> <li><span class="u-custom-list-number">(b)</gydF4y2Baspan><p>如果<gydF4y2Baspan class="mathjax-tex">\ (sin \θ< \压裂{R_{\左\ {ij0 \右\}}}{R_{\左\{100 \ \}}}< \压裂{1}{cosθ\}\)</gydF4y2Baspan>(100)和{<gydF4y2Bai>ij</gydF4y2Bai>0}将公开</gydF4y2Bap></li> <li><span class="u-custom-list-number">(c)</gydF4y2Baspan><p>如果<gydF4y2Baspan class="mathjax-tex">\(\压裂{R_{\左\ {ij0 \右\}}}{R_{\左\{100 \ \}}}\通用电气\压裂{1}{cosθ\}\)</gydF4y2Baspan>,只有垂直(100)飞机出现</gydF4y2Bap></li> </ol> <p>蚀刻形状对应条件(a)、(b)和(c)见图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>(一)——(c),分别。它可以很容易地观察到在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>< 100 >补偿几何提供大幅凸角只有在条件<gydF4y2Baspan class="mathjax-tex">\(\压裂{R_{\左\ {ij0 \右\}}}{R_{\左\{100 \ \}}}\通用电气\压裂{1}{cosθ\}\)</gydF4y2Baspan>只满足胎侧即拥有垂直{100}飞机在蚀刻所证明的扫描电镜照片和图的示意图吗<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>(c)。</gydF4y2Bap> <p>为了得到一个关系来确定< 100 >梁的长度(即。<gydF4y2Bai>l</gydF4y2Bai><sub>< 100 ></gydF4y2Basub>),连续的蚀刻轮廓,如黑色虚线所示图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>应该分析。横向腐蚀速率图是用来说明削弱的方向自由端和< 100 >面具边缘。进步蚀刻概要图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>提出的条件<gydF4y2Baspan class="mathjax-tex">\(\压裂{R_{\左\ {ij0 \右\}}}{R_{\左\{100 \ \}}}\通用电气\压裂{1}{cosθ\}\)</gydF4y2Baspan>因为它提供了锋利的边缘凸角。削弱了在自由端是由快速腐蚀高指数的飞机,而横向削弱在< 100 >边发生的腐蚀主要是由于{100}的飞机。本设计旨在实现侧凸角的削弱的{100}面出现在< 100 >边缘。出于同样的原因,梁的宽度应该是两倍所需的腐蚀深度和梁应该足够长,以便最终形状的凸角是由{100}的横向削弱飞机。为了确定梁的长度(即。<gydF4y2Bai>l</gydF4y2Bai><sub>< 100 ></gydF4y2Basub>)实现微观结构完好的凸角到腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>(即。<gydF4y2Baspan class="mathjax-tex">\ \压裂{1}({2}W \)</gydF4y2Baspan>)之间的关系<gydF4y2Bai>l</gydF4y2Bai><sub>< 110 ></gydF4y2Basub>和<gydF4y2Bai>d</gydF4y2Bai>可以通过制定开发各种线的方程。</gydF4y2Bap> <p>一条直线的方程某人(例如<<gydF4y2Bai>lm0</gydF4y2Bai>>,一个快速腐蚀前线)通过定点<gydF4y2Baspan class="mathjax-tex">左(\ (\ mathrm {B} \ \压裂{1}{\ sqrt{2}}{1} _{< 100 >} -大概{2}\ d \压裂{1}{\ sqrt {2}} {1} _ {< 100 >} \) \)</gydF4y2Baspan>和斜率tanα< 110 >边</gydF4y2Bap> <div id="Equ7" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ \ mathrm {y} - \压裂{1}{\ sqrt {2}} {\ mathrm {L}} _ {< 100 >} = \ tanα\ \离开(x - \压裂{1}{\ sqrt {2}} {\ mathrm {L}} _ {< 100 >} + \ sqrt {2} \ mathrm {d} \) \ \ Rightarrow \罪\α。x - \因为\α。\ mathrm {y} + \压裂{L_ {< 100 >}} {\ sqrt{2}} \离开(\因为\α-α\罪\ \右)+ \ sqrt {2} \ mathrm {d} \罪\α= 0 $ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (7)</dgydF4y2Baiv> </div> <p>垂直距离点O(0, 0)一行某人(例如<<gydF4y2Bai>lm</gydF4y2Bai>0 >方向)</gydF4y2Bap> <div id="Equ8" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ {d} _1 = \压裂{L_ {< 100 >}} {\ sqrt{2}} \离开(\因为\α-α\罪\ \右)+ \ sqrt {2} d \罪\α$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (8)</dgydF4y2Baiv> </div> <p>一条直线的方程AB(例如< 100 >行)通过一点一(<gydF4y2Baspan class="mathjax-tex">\ \√{2}d, 0 \大)\)</gydF4y2Baspan>和做一个45°角< 110 >边</gydF4y2Bap> <div id="Equ9" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ x - y -大概{2}\ d = 0美元美元</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (9)</dgydF4y2Baiv> </div> <p>它可以注意到在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>点的垂直距离“O”行“AB”<gydF4y2Bai>d</gydF4y2Bai>(即腐蚀深度)。为了实现一把锋利的边缘凸角梁应被横向腐蚀的{100}面< 100 >边缘,因此必须满足以下条件:</gydF4y2Bap> <div id="Equ10" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ {\ mathrm {d}} _1 {\ mathrm {R}} _ {< lm0 >} = {\ mathrm {d} \ mathrm {R}} _ {< 100 >} $ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (10)</dgydF4y2Baiv> </div> <p>在哪里<gydF4y2Bai>R</gydF4y2Bai><sub>< 100 ></gydF4y2Basub>和<gydF4y2Bai>R</gydF4y2Bai><sub><<gydF4y2Bai>lm</gydF4y2Bai>0 ></gydF4y2Basub>沿着垂直方向的腐蚀率。</gydF4y2Bap> <p>替代的价值<gydF4y2Bai>d</gydF4y2Bai><sub>1</gydF4y2Basub>从方程(<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="equation anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">8</一个>)到方程(<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="equation anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">10</一个>)和重新排列,得到</gydF4y2Bap> <div id="Equ11" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ d = \压裂{R_ {< lm0 >}} {R_{< 100 >}} \离开(\压裂{L_ {< 100 >}} {\ sqrt{2}} \离开(\因为\α-α\罪\ \右)+ \ sqrt {2} d \罪\α\右)$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (11)</dgydF4y2Baiv> </div> <p>微观结构的制造中使用< 100 >梁25 wt % TMAH 40 wt % KOH数据所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">33</一个>分别(a)和(b)。它可以从SEM照片指出,微观结构包含形状规整的凸角。如前所述,< 100 >梁提供了锐利的凸角只有在条件<gydF4y2Baspan class="mathjax-tex">\(\压裂{R_{\左\ {ij0 \右\}}}{R_{\左\{100 \ \}}}\通用电气\压裂{1}{cosθ\}\)</gydF4y2Baspan>是满意的。如果一个腐蚀剂(或蚀刻条件)不满足这个关系,三角(或广场)的形状可以是一个更好的选择。的蚀刻surfactant-added TMAH(或IPA-added KOH)暴露在< 100 >{110}面边缘如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">32</一个>(a),因此这种类型的腐蚀剂并不适合使用< 100 >梁制造锋利的凸角补偿几何(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4181">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 133" title="133年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4184">133年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4188">146年</一个>]。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-33" data-title="Figure 33"> <figure> <figcaption> <b id="Fig33" class="c-article-section__figure-caption" data-test="figure-caption-text">图33</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/33" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig33_HTML.gif?as=webp"> <img aria-describedby="Fig33" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig33_HTML.gif" alt="图33gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-33-desc"> <p><b>微观结构的扫描电镜照片伪造TMAH和KOH使用< 100 >取向补偿梁如图</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <p><b>(v)叠加广场:</gydF4y2Bab>研究的主要部分在角落补偿法的前提下尽可能地减少空间需求集中在凸角的质量。空间要求一个特定的蚀刻剂主要由两个因素决定:补偿模式的形状和腐蚀剂的角落削弱。然而,< 100 >−面向梁薪酬设计提供了非常锋利的角落里,高空间要求沿着它的长度是一个严重的问题。为了减少空间需求,叠加广场造型设计提出了(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 107" title="107年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4225">107年</一个>]。在这种几何,一侧的一个广场<gydF4y2Bai>一个</gydF4y2Bai>和两个方面<gydF4y2Bai>一个</gydF4y2Bai>/ 2叠加在凸角的顶点,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">34</一个>。补偿结构在不同的形状在蚀刻步骤指定的虚线。在这种情况下,结构是首次被快速腐蚀的飞机出现在凸角(即B, D, E, F和H)。在有限区间,根据尺寸和蚀刻参数,蚀刻前转换为< 100 >取向梁的自由端是由<<gydF4y2Bai>lm</gydF4y2Bai>0 >蚀刻线,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">34</一个>(b)。在这个阶段,既削弱横向腐蚀所得的{100}面和快速传播的飞机在自由端。类似于< 100 >梁,凸角的形状应采取垂直侧腐蚀的{100}飞机如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">34</一个>(c)。为了得到锋利边缘凸角(即标准的凸角垂直的横向腐蚀{100}飞机),必须满足以下条件(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 107" title="107年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4247">107年</一个>]:</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-34" data-title="Figure 34"> <figure> <figcaption> <b id="Fig34" class="c-article-section__figure-caption" data-test="figure-caption-text">图34</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/34" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig34_HTML.gif?as=webp"> <img aria-describedby="Fig34" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig34_HTML.gif" alt="图34gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-34-desc"> <p><b>叠加广场几何角补偿:(一)示意图;(b)蚀刻轮廓</gydF4y2Bab><b><i>t</gydF4y2Bai></b><sub><b>1</gydF4y2Bab></sub><b>在时间和(c)蚀刻轮廓</gydF4y2Bab><b><i>t</gydF4y2Bai></b><sub><b>2</gydF4y2Bab></sub><b>(></gydF4y2Bab><b><i>t</gydF4y2Bai></b><sub><b>1</gydF4y2Bab></sub><b>当结构转换为< 100 >梁</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 107" title="107年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4300">107年</一个>]<gydF4y2Bab>。</gydF4y2Bab>2006年与眼压的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/34" data-track-dest="link:Figure34 Full size image" aria-label="Full size image figure 34" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div id="Equ12" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">左(= V $ $ \ \压裂{R_ {< lm0 >}} {R_{< 100 >}} \右)< \压裂{\离开(3 \因为罪\α2 \ \α\)\离开谭(\ \α+ 1 \右)}{\ sqrt {2}} $ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (12)</dgydF4y2Baiv> </div> <p>之间的关系的详细推导广场边<gydF4y2Bai>一个</gydF4y2Bai>和腐蚀深度d给(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 107" title="107年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4436">107年</一个>]:</gydF4y2Bap> <div id="Equ13" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">左$ $ d = \[\压裂{2 \罪\ \ cosα+ \α}{4 v} + \压裂{\ sqrt{2}}{4 \离开谭(\ \α+ 1 \右)}\右]$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (13)</dgydF4y2Baiv> </div> <p>台面结构的扫描电镜图片制作30 wt % KOH和25 wt % TMAH图所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">35</一个>分别(a)和(b)。在这两种情况下,台面结构的凸角是定义良好的。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-35" data-title="Figure 35"> <figure> <figcaption> <b id="Fig35" class="c-article-section__figure-caption" data-test="figure-caption-text">图35</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/35" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig35_HTML.gif?as=webp"> <img aria-describedby="Fig35" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig35_HTML.gif" alt="图35gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-35-desc"> <p><b>台面结构的扫描电镜照片伪造(a) 30 wt % KOH在80°C (w .博士的风扇,工作在北京大学)和(b) 25 wt % TMAH在70°C使用叠加广场作为补偿模式。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/35" data-track-dest="link:Figure35 Full size image" aria-label="Full size image figure 35" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>正如前面提到的,这种设计依赖于蚀刻概要文件转换为一束< 100 >和< 100 >梁不适合凸角的制造使用surfactant-added TMAH。因此叠加形成的补偿几何方块不适合实现尖角surfactant-added TMAH。基于上述讨论,它可以表示,没有提供任何补偿设计改进已近尖凸角获得surfactant-added 25%无偿TMAH呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>(d) (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4562">120年</一个>]。</gydF4y2Bap> <p><b>薪酬设计(vi)角落弯V-grooves:</gydF4y2Bab>与角落薪酬设计相关的基本问题是大空间的需求在凸角。在几种微观结构,例如,台面结构弯曲V-grooves包围和芯片隔离的交叉V-grooves呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">36</一个>,周围的可用空间的凸角小于所需的补偿结构。在这些情况下,简单的薪酬结构(如正方形、三角形、< 100 >和< 110 >梁)不能被使用,因为他们不能安装在现有的空间在拐角处。如前所述,空间要求一个特定的蚀刻剂主要由两个因素决定:补偿模式的形状和腐蚀剂的角落削弱。各种设计已报告制作V-grooves弯曲。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-36" data-title="Figure 36"> <figure> <figcaption> <b id="Fig36" class="c-article-section__figure-caption" data-test="figure-caption-text">图36</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/36" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig36_HTML.gif?as=webp"> <img aria-describedby="Fig36" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig36_HTML.gif" alt="图36gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-36-desc"> <p><b>湿的示意图表示大部分微型机械结构的有限的空间在凸角:(a) v型槽连接到广场孔径;(b)台面结构弯曲V-grooves包围;(c) V-grooves芯片隔离。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/36" data-track-dest="link:Figure36 Full size image" aria-label="Full size image figure 36" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>迈耶<gydF4y2Bai>et al。</gydF4y2Bai>提出了一个面向设计的< 100 >的光束被分散成狭窄< 110 >条双方及其自由端连接到外部面具(或帧)的窄束只是为了消除凸角,提出了图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">37</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 92" title="92年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4606">92年</一个>]。在这种情况下,薪酬结构的腐蚀开始只有凸角的< 110 >窄梁的自由端。一旦削弱< 110 >的自由端带到了主要的< 100 >梁,它所得的横向腐蚀梁的两侧。的尺寸补偿模式可以很容易地计算使用示意图如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">37</一个>(b)。主要的消费< 100 >梁通过垂直横向削弱了{100}飞机了<gydF4y2Baspan class="mathjax-tex">\ \(压裂{W_ {< 100 >}} {2} \)</gydF4y2Baspan>腐蚀深度,<gydF4y2Bai>W</gydF4y2Bai><sub>< 100 ></gydF4y2Basub>< 100 >梁的宽度。< 110 >取向狭窄的长度(即。<gydF4y2Bai>l</gydF4y2Bai><sub>< 110 ></gydF4y2Basub>)腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>可以计算如下:</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-37" data-title="Figure 37"> <figure> <figcaption> <b id="Fig37" class="c-article-section__figure-caption" data-test="figure-caption-text">图37</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/37" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig37_HTML.gif?as=webp"> <img aria-describedby="Fig37" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig37_HTML.gif" alt="图37gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-37-desc"> <p><b>角补偿设计的实现弯曲v型槽使用面向(a) < 100 >梁,几个< 110 >取向狭窄两边添加;(b)狭窄的尺寸;(c)顺序V-grooves</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 92" title="92年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4675">92年</一个><b>]</gydF4y2Bab><b>(电化学社会的许可、版权1990);(d)台面结构弯曲包围在40 wt % KOH V-grooves捏造。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/37" data-track-dest="link:Figure37 Full size image" aria-label="Full size image figure 37" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div id="Equ14" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ ${1}_{< 110 >}= \离开(\ mathrm {d} - \压裂{W_{< 100 >}}{2} \) \乘以V \ \压裂{1}{\罪\α}$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (14)</dgydF4y2Baiv> </div> <p>在哪里<gydF4y2Baspan class="mathjax-tex">左(= \ \ (V \压裂{R_ {< lm0 >}} {R_ {< 100 >}} \) \)</gydF4y2Baspan>腐蚀速率比值<<gydF4y2Bai>lm</gydF4y2Bai>0 >(或削弱方向在凸角)和< 100 >方向。</gydF4y2Bap> <p>很明显从关系< 110 >条的长度是独立于它的宽度。这取决于腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>、宽度的主要< 100 >梁(即。<gydF4y2Baspan class="mathjax-tex">\ \(压裂{W_ {< 100 >}} {2} \)</gydF4y2Baspan>)和坡角<gydF4y2Bai>α</gydF4y2Bai>在凸角。因此< 110 >条的宽度可以选择根据方便。这种类型的补偿结构可以提供锋利边缘凸角只有补偿几何最后被垂直的横向腐蚀{100}的飞机。然而,几乎垂直的切口型蚀刻轮廓由< 110 >条扭曲,导致的外观质量的底部伸出凸角可以观察到图的扫描电镜图像<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">37</一个>。如果蚀刻继续删除这个额外的质量在底部,严重削弱了从主要凸角开始降解台面的形状,可以看到图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">37</一个>(d)。此外,这种方法需要更多的空间在V-grooves因此合适的长度只有槽不够长。</gydF4y2Bap> <p>Enoksson作出了一些修改< 100 >梁,提出了图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">38</一个>最小化空间要求高的问题(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 101" title="101年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4905">101年</一个>]。在这个设计一个狭缝是注册在中间的凹角。狭缝的长度必须稍微超过两倍所需的腐蚀深度,确保补偿结构完全钻蚀。的进步变化的形状补偿结构在腐蚀过程中虚线所示。上半年的光束(即到C点)被削弱的{100}的垂直平面。削弱的一和b的穿过彼此点“C”,随后削弱也开始从“C”点。类似于简单的< 100 >梁(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>),梁的宽度选择蚀刻深度的两倍。图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">38</一个>(b)介绍了凸角的SEM照片制作使用修改后的< 100 >梁如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">38</一个>(一个)。尽管图中给出的补偿几何<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">38</一个>需要更少的空间相比,简单的< 100 >梁(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">30.</一个>),它不适合弯曲V-grooves的制造。此外,它不提供一些锋利的边缘角落残留在图的下方清晰可见<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">38</一个>(b)。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-38" data-title="Figure 38"> <figure> <figcaption> <b id="Fig38" class="c-article-section__figure-caption" data-test="figure-caption-text">图38</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/38" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig38_HTML.gif?as=webp"> <img aria-describedby="Fig38" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig38_HTML.gif" alt="图38gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-38-desc"> <p><b>修改< 100 >梁:(一)示意图和(b)编造的凸角使用这个设计的扫描电镜照片</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 101" title="101年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4940">101年</一个>]<gydF4y2Bab>。</gydF4y2Bab>1997年与眼压的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/38" data-track-dest="link:Figure38 Full size image" aria-label="Full size image figure 38" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>为了实现弯曲V-grooves Wacogne<gydF4y2Bai>et al。</gydF4y2Bai>提出了一种设计组成的长方形和正方形叠加模式如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">39</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 118" title="118年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e4964">118年</一个>]。蚀刻的发展概要文件,开始从角落B和H,由虚线所示。在这个设计中,保护时间主要取决于距离的斜方向<<gydF4y2Bai>lm</gydF4y2Bai>0 >点B (H)从O点所示<gydF4y2Bai>r</gydF4y2Bai>在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">39</一个>(b)。这可以制定的坡角(<gydF4y2Bai>α</gydF4y2Bai>)和矩形带的尺寸(即长度<gydF4y2Bai>l</gydF4y2Bai><sub>1</gydF4y2Basub>和宽度(<gydF4y2Bai>g</gydF4y2Bai><sub>1</gydF4y2Basub>- - - - - -<gydF4y2Bai>g</gydF4y2Bai><sub>2</gydF4y2Basub>)作为广场和< 110 >做补偿几何图形。此外,距离<gydF4y2Bai>r</gydF4y2Bai>可以与腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>和<的腐蚀率<gydF4y2Bai>lm</gydF4y2Bai>0 >和< 100 >(即R<gydF4y2Basub><<gydF4y2Bai>lm</gydF4y2Bai>0 ></gydF4y2Basub>和R<gydF4y2Basub>< 100 ></gydF4y2Basub>)如下:</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-39" data-title="Figure 39"> <figure> <figcaption> <b id="Fig39" class="c-article-section__figure-caption" data-test="figure-caption-text">图39</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/39" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig39_HTML.gif?as=webp"> <img aria-describedby="Fig39" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig39_HTML.gif" alt="图39gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-39-desc"> <p><b>制造的微观结构弯曲V-grooves:(一)示意图{100}晶片的弯曲的v型槽;(b)面具与角落薪酬结构模式;(c) - (d)装配式结构</gydF4y2Bab><b>(</gydF4y2Bab><a data-track="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 118" title="118年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5030">188bet登录入口 </a> </div> </figure> </div> <div id="Equ15" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ $ {rR} _{< 100 >} ={博士}_ {< lm0 >} \ \ Rightarrow r = d \压裂{R_ {< lm0 >}} {R_ {< 100 >}} \ \ Rightarrow r = dV $ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (15)</dgydF4y2Baiv> </div> <p>方向意味着的腐蚀速率的速度在蚀刻在一个方向垂直于边缘。补偿片的长度可以定义如下:</gydF4y2Bap> <div id="Equ16" class="c-article-equation"> <div class="c-article-equation__content"> <span class="mathjax-tex">$ ${1}_1 = \压裂{R_ {< \ mathrm 0 > {lm}}} {R_{< 100 >}} \压裂{d}{\罪\α}- \压裂{g_1里面- {g} _2} {\ tan \α}$ $</gydF4y2Baspan> </div> <div class="c-article-equation__number"> (16)</dgydF4y2Baiv> </div> <p>这个方程是有效的只有长度<gydF4y2Bai>l</gydF4y2Bai><sub>1</gydF4y2Basub>大于宽度(<gydF4y2Bai>g</gydF4y2Bai><sub>1</gydF4y2Basub>- - - - - -<gydF4y2Bai>g</gydF4y2Bai><sub>2</gydF4y2Basub>)。这是相同的情况下考虑< 110 >补偿几何。此外,平方DEFX(或宽度的大小<gydF4y2Bai>g</gydF4y2Bai><sub>2</gydF4y2Basub>)应该尽可能小,以确保它被消耗在斜面方向<<gydF4y2Bai>lm</gydF4y2Bai>0 >从B和H点达到主要的凸角o .图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">39</一个>(c)和(d)弯曲的形状在40 wt % KOH V-grooves捏造55°c使用补偿设计如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">39</一个>(b)。它可以注意到完美的补偿是不可能使用这种设计的变形补偿结构的凸角和一些残留的底部角落里清晰可见。而且这种设计可以使用只有在槽的长度足够补偿设计模式。</gydF4y2Bap> <p>补偿模式的设计一直是一个主要问题,空间是有限的。继续努力克服问题的高空间要求和制造形状规整的角落,麦克尔<gydF4y2Bai>et al。</gydF4y2Bai>提出面向叠加< 110 >的光束,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">40</一个>,形成交叉V-grooves芯片隔离(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 98" title="98年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5334">98年</一个>]。可以指出的SEM照片越过V-grooves图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">40</一个>(b),角落受损和一些残余质量仍在底部表面。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-40" data-title="Figure 40"> <figure> <figcaption> <b id="Fig40" class="c-article-section__figure-caption" data-test="figure-caption-text">图40</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/40" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig40_HTML.gif?as=webp"> <img aria-describedby="Fig40" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig40_HTML.gif" alt="图40gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-40-desc"> <p><b>角落的补偿结构制造芯片的沟槽隔离</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 98" title="98年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5353">98年</一个>]<gydF4y2Bab>。</gydF4y2Bab>1995年与眼压的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/40" data-track-dest="link:Figure40 Full size image" aria-label="Full size image figure 40" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <p>图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">41</一个>(一个)显示了一个补偿方案锥体孔径与v型槽的加工图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">36</一个>(a),虚线指定结构腐蚀所得的形状。补偿模式的演变蚀刻轮廓清晰表明,凸角的显著的斜面将A和b .如果广场这个斜面可以减少补偿几何形状(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">41</一个>(一))被不对称< 110 >梁如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">41</一个>(b),但是这种设计也将无法提供定义良好的角落中讨论部分<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="section anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">角补偿几何图形是{100}晶片</一个>(< 110 >取向梁)。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-41" data-title="Figure 41"> <figure> <figcaption> <b id="Fig41" class="c-article-section__figure-caption" data-test="figure-caption-text">图41</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/41" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig41_HTML.gif?as=webp"> <img aria-describedby="Fig41" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig41_HTML.gif" alt="图41gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-41-desc"> <p><b>面具模式的示意图与补偿几何制造微结构与v型槽连接到一个方形孔,如图</gydF4y2Bab><a data-track="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">188bet登录入口 </a> </div> </figure> </div> <p>在凸角弯曲V-grooves包围的情况下,它可以得出结论,没有补偿几何提供了良好的保护凸角如果蚀刻是纯KOH和TMAH溶液中完成的。然而,新的蚀刻剂改善情况的调查<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5418">120年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 134" title="134年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5421">134年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5424">146年</一个>]。已知Surfactant-added TMAH提供最低削弱各种角落和边缘,可以看到图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>。在不同浓度的TMAH, 25%减少削弱TMAH是最有利的选择而实现光滑的表面光洁度和合理的腐蚀速率的{100}面(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 134" title="134年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5430">134年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 136" title="136年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5434">136年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 140" title="140年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5437">140年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 142" title="142年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5440">142年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 145" title="145年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5443">145年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 146" title="146年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5446">146年</一个>]。腐蚀剂,任何形状的补偿设计可以方便地安装在访问空间的形成为芯片隔离和弯曲V-grooves凹槽。这意味着surfactant-added TMAH消除大空间需求的问题。正如前面所讨论的,surfactant-added THAH不可行的凸角的制造,因为飞机出现在边缘的补偿设计的腐蚀率低于{100}。如果三角(或广场)补偿几何采用挤压向底部角落方面会遇到相反的{111}面作为一个屏障,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">42</一个>(a)。因此,挤压由于额外的硅在这种结构可以减少凸角。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-42" data-title="Figure 42"> <figure> <figcaption> <b id="Fig42" class="c-article-section__figure-caption" data-test="figure-caption-text">图42</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/42" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig42_HTML.gif?as=webp"> <img aria-describedby="Fig42" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig42_HTML.gif" alt="图42gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-42-desc"> <p><b>用弯曲的V-grooves制造(a)的微观结构和(b)的芯片隔离沟槽表面活性剂添加25 wt % TMAH使用三角形薪酬结构(</gydF4y2Bab><a data-track="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 120" title="120年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5466">188bet登录入口 </a> </div> </figure> </div> <p>在三角形正方形和三角形的补偿结构,由于其简单的设计更方便。在腐蚀过程中,消耗,同时保持原来的形状。台面结构弯曲V-grooves包围和芯片的沟槽隔离使用三角形如图捏造<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">42</一个>分别(a)和(b)。它可以观察到在SEM照片,凸角良好的保护。它可以在这里强调surfactant-added TMAH是一个最佳选择的实现凸角与弯曲V-grooves包围。正如前面所讨论的那样,纯粹的KOH和TMAH不适合制造锥体光圈与v型槽与明确的凸角。surfactant-added的解决方案是一个适当的选择制造这样的锥体孔径呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">43</一个>。这种结构通常所需的广泛的应用,尤其是在微流体和微生物学领域。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-43" data-title="Figure 43"> <figure> <figcaption> <b id="Fig43" class="c-article-section__figure-caption" data-test="figure-caption-text">图43</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/43" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig43_HTML.gif?as=webp"> <img aria-describedby="Fig43" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig43_HTML.gif" alt="图43gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-43-desc"> <p><b>连接到V-grooves锥体光阑的扫描电镜照片。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/43" data-track-dest="link:Figure43 Full size image" aria-label="Full size image figure 43" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <h4 class="c-article__sub-heading c-article__sub-heading--small" id="Sec9">角补偿几何图形是{110}晶片</gydF4y2Bah4> <p>{110}硅表面有两个折角的对称性,因此尖角的方向取决于{111}飞机出现在数字<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">2</一个>(b)和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">3</一个>(b),类似于{100}面,削弱了发生在{110}面凸角。因此,为了制造一个微观结构与凸角Si{110}晶片,额外的结构必须添加在拐角处的保护在蚀刻步骤。在{100}晶片的情况下,薪酬结构提供了定义良好的角落里如果它被垂直的横向腐蚀{100}的飞机。然而,这样的腐蚀特征在{110}晶片是不可能的。此外,{110}晶片不适合制造MEMS结构使用surfactant-added TMAH因为它很低这腐蚀剂腐蚀率呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">12</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 37" title="37gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5529">37</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 40" title="40gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5532">40</一个>]。为了保护{110}晶圆的角落,主要三种补偿几何,即三角形、菱形,和parallelogramic梁,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">21</一个>和<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 115" title="115年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5542">115年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 117" title="117年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5545">117年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5548">128年</一个>]。这些设计研究了垂直相交形成的凸角的{111}面(或< 112 >方向)。这些几何图形的设计方法在下面简要描述。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-44" data-title="Figure 44"> <figure> <figcaption> <b id="Fig44" class="c-article-section__figure-caption" data-test="figure-caption-text">图44</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/44" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig44_HTML.gif?as=webp"> <img aria-describedby="Fig44" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig44_HTML.gif" alt="图44gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-44-desc"> <p><b>不同形状的示意图表示角补偿几何图形即(一)三角形,(b)菱形或方形,(c)保护parallelogramic梁凸角在{110}硅片制造</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5564">128年</一个>]<gydF4y2Bab>。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/44" data-track-dest="link:Figure44 Full size image" aria-label="Full size image figure 44" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(我)</gydF4y2Baspan><p><b>三角</gydF4y2Bab>:{100}晶片的情况下,讨论了削弱角落的形状(即坡角)和削弱的数量(即长度的打压<gydF4y2Bai>l</gydF4y2Bai>)与腐蚀深度(<gydF4y2Bai>d</gydF4y2Bai>)从etchant-to-etchant取决于腐蚀条件和不同。因此这些参数必须被调查的设计补偿几何。这种结构的设计背后的概念是一样的{100}晶片。然而,薪酬结构不能相同的各个角落,包括在凸角角落并不相同,可以看到图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>。在这个设计中,边钝角三角形的角的方向相同的方向削弱在急性角落,反之亦然,如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>(一个)。在缺乏补偿模式,斜切的形状(或削弱形状)在钝角和锐角红色和黄色线所示,分别。连续蚀刻的补偿模式在蚀刻用虚线表示。双方摩根大通和KP的补偿在急性三角形角的选择符合<<gydF4y2Bai>uuv</gydF4y2Bai>>家庭的行对应方向的削弱钝角角落的红色线。同样在钝角三角形的边角落莫和罗应该配合<<gydF4y2Bai>llm</gydF4y2Bai>>在急性角方向的方向削弱如图所示黄色。为了计算三角形的尺寸使用正弦规律,坡角和削弱的长度沿< 112 >方向迟钝(即。<gydF4y2Bai>α</gydF4y2Bai><sub>o</gydF4y2Basub>和<gydF4y2Bai>l</gydF4y2Bai><sub><i>o</gydF4y2Bai></sub>)和急性(即。<gydF4y2Bai>α</gydF4y2Bai><sub><i>一个</gydF4y2Bai></sub>和<gydF4y2Bai>l</gydF4y2Bai><sub><i>一个</gydF4y2Bai></sub>)角度必须已知。急性和钝角凸角的SEM照片制作使用三角补偿模式在80°C 42.5 wt % KOH图所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">45</一个>分别为(a)和(b) (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 116" title="116年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5648">116年</一个>]。它可以很容易地发现没有一个角落是形状规整,细长的残留在不同长度的两种类型的角落。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-45" data-title="Figure 45"> <figure> <figcaption> <b id="Fig45" class="c-article-section__figure-caption" data-test="figure-caption-text">图45</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/45" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig45_HTML.gif?as=webp"> <img aria-describedby="Fig45" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig45_HTML.gif" alt="图45gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-45-desc"> <p><b>SEM照片(a)急性和(b)迟钝的凸角制作使用三角补偿模式42.5 wt % KOH在80°C</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 116" title="116年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5665">116年</一个>]<gydF4y2Bab>。</gydF4y2Bab>随着社会电化学的许可,1998年版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/45" data-track-dest="link:Figure45 Full size image" aria-label="Full size image figure 45" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div></li> <li><span class="u-custom-list-number">(2)</gydF4y2Baspan><p><b>菱形(或平方):</gydF4y2Bab>这个设计是一个缩短版本的三角形模式在前一节中讨论。这种形状的最初的想法是一样的一个报告的普洱茶<gydF4y2Bai>等</gydF4y2Bai>。广场设计的形状形成的凸角补偿模式在Si {100}<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 91" title="91年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5697">91年</一个>]。的补偿菱形沿< 112 >方向保持一致。菱形的中心正值凸角的顶点,最大大小可镌刻的三角形如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>(b),在腐蚀过程中补偿菱形是完全被削弱,从三个凸角(A, b和C在急性角落,E、F和G钝角角落),图中的虚线所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>(b)。菱形图案的尺寸可以简单地使用正弦计算规则为其他结构早些时候完成。凸角的SEM图像伪造在纯和IPA-added 40 wt % KOH数据所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">46</一个>分别(i)和(ii) (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 115" title="115年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5710">115年</一个>]。在所有情况下除外急性角在IPA-added KOH(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">46</一个>(c)——),形状不规则残渣可以很容易地观察到。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-46" data-title="Figure 46"> <figure> <figcaption> <b id="Fig46" class="c-article-section__figure-caption" data-test="figure-caption-text">图46</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/46" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig46_HTML.gif?as=webp"> <img aria-describedby="Fig46" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig46_HTML.gif" alt="图46gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-46-desc"> <p><b>扫描电镜图像的凸角捏造纯粹(i)和(ii)音标添加40% KOH使用菱形补偿几何</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 115" title="115年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5729">115年</一个>]<gydF4y2Bab>。</gydF4y2Bab>2006年与爱思唯尔的许可、版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/46" data-track-dest="link:Figure46 Full size image" aria-label="Full size image figure 46" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div></li> <li><span class="u-custom-list-number">(3)</gydF4y2Baspan><p><b>Parallelogramic梁(或梁):</gydF4y2Bab>在这种方法中,面向< 112 >的梁(或parallelogramic梁)是安装在凸角。为了计算梁的长度来保护腐蚀深度的角落<gydF4y2Bai>d</gydF4y2Bai>,削弱和腐蚀深度的数据应该是可用的。如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">44</一个>(c),补偿梁的长度相应削弱长度<gydF4y2Bai>l</gydF4y2Bai><sub><i>o</gydF4y2Bai></sub>(即QX)腐蚀深度<gydF4y2Bai>d</gydF4y2Bai>应该QY。在这个设计中,波束宽度不发挥任何作用,它应该尽可能小,但它不应被削弱的{111}面外侧出现在它的边缘。这种结构的特点是,同样大小的光束被添加在锐角和钝角的角落。凸角捏造的SEM照片42.5 wt % KOH使用波束形状补偿几何呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">47</一个>分别(a)和(b)。一个悬臂梁的SEM图像垂直在{110}侧壁晶片实现25 wt % TMAH使用这个设计如图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">48</一个>。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-47" data-title="Figure 47"> <figure> <figcaption> <b id="Fig47" class="c-article-section__figure-caption" data-test="figure-caption-text">图47</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/47" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig47_HTML.gif?as=webp"> <img aria-describedby="Fig47" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig47_HTML.gif" alt="图47gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-47-desc"> <p><b>SEM照片(a)急性和(b)迟钝的凸角制作使用parallelogramic梁补偿设计42.5 wt % KOH在80°C</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 116" title="116年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5796">116年</一个>]<gydF4y2Bab>。</gydF4y2Bab>随着社会电化学的许可,1998年版权。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/47" data-track-dest="link:Figure47 Full size image" aria-label="Full size image figure 47" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-48" data-title="Figure 48"> <figure> <figcaption> <b id="Fig48" class="c-article-section__figure-caption" data-test="figure-caption-text">图48</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/48" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig48_HTML.gif?as=webp"> <img aria-describedby="Fig48" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig48_HTML.gif" alt="图48gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-48-desc"> <p><b>扫描电镜的照片与垂直悬臂梁在{110}侧壁晶片实现25 wt % TMAH使用波束形状补偿模式的角落。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/48" data-track-dest="link:Figure48 Full size image" aria-label="Full size image figure 48" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div></li> </ol> <h3 class="c-article__sub-heading" id="Sec10">使用两步蚀刻技术完美的凸角</gydF4y2Bah3> <p>凸角补偿技术依赖于时滞蚀刻的通过一些添加额外的几何。补偿结构的尺寸取决于腐蚀深度的凸角必须被创建。这种技术,因此,需要(a)精确控制的腐蚀速率和(b)高度统一的晶片厚度。凸角的结果如果腐蚀损坏的角落超过规定的腐蚀时间执行。此外,在角落里补偿法、高空间需求是一个大问题,尤其是当相邻结构之间的空间是有限的。因此,实现非常锋利的角落里没有任何损害的凸边(或任何残留在底部表面)是一个单调乏味的任务。为了避免这些问题,与理想的尖角制造微观结构,两种技术开发(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 69" title="69年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5846">69年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 111" title="111年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5849">111年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 113" title="113年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5852">113年</一个>]。凸角是由两个{111}平面的交点,在这些技术中,{111}飞机在两个步骤是捏造出来的。后制作的两个凸角的{111}面,它是保护屏蔽层。此后,在下一步的蚀刻,第二架飞机是实现。因此这两种方法都提供非常干净和锋利的凸角,但光刻技术需要两个口罩和湿蚀刻在执行两个步骤。讨论了这些技术的制造步骤在下面:</gydF4y2Bap> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(我)</gydF4y2Baspan><p>第一种技术的流程步骤,Kwon提出的<gydF4y2Bai>et al。</gydF4y2Bai>图中描述<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">49</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 69" title="69年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5871">69年</一个>]。凸角的制造是使用两个面具。使用面膜# 1定义一个模式后,采用各向异性蚀刻形成空腔的深度(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">49</一个>(b))。此后掩蔽层沉积在硅公开。屏蔽层可以热氧化或化学汽相淀积氮化硅。如果氧化物用作面具,KOH不是一个合适的腐蚀剂,展览有限氧化腐蚀率。在这种情况下,应该使用TMAH腐蚀剂。随后的屏蔽层的沉积,第二步光刻技术是使用面膜# 2执行模式的侧壁上的屏蔽层顶面。由于不均匀的表面形貌,很难外套的光刻胶均匀厚度使用旋转涂布技术(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 167" title="167年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5877">167年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 169" title="169年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5881">169年</一个>]。使用标准的液态光致抗蚀剂沉积厚度不均匀的旋转涂布过程的结果,特别是在胎侧倾斜和凸边/角。凸边,甚至电影可能不连续,因为这些边缘的光致抗蚀剂回流由于表面张力。很薄或不连续的光刻胶涂在凸边未能保护屏蔽层在腐蚀过程中锋利的边缘。反过来,这导致蚀刻硅的各向异性腐蚀。此外,由于旋转涂布光刻胶回流,过多的光刻胶腔的底部/战壕上堆积。为了外套常数光刻胶厚度,采用喷涂方法。spray-coated光刻胶的厚度、均匀性和表面粗糙度取决于几个参数如光刻胶的粘度,孔的喷嘴,空气压力应用于喷嘴(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 169" title="169年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5884">169年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 171" title="171年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5887">171年</一个>]。屏蔽层模式后,使用光刻的第二步(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">49</一个>(c)),下一步进行各向异性腐蚀(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">49</一个>(d))。最后,掩模层全球如果需要可以删除。微观结构的扫描电镜图片使用这种方法如图制作的<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">49</一个>(f) (<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 69" title="69年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5900">69年</一个>]。它可以注意到凸角是良好的保护。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-49" data-title="Figure 49"> <figure> <figcaption> <b id="Fig49" class="c-article-section__figure-caption" data-test="figure-caption-text">图49</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/49" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig49_HTML.gif?as=webp"> <img aria-describedby="Fig49" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig49_HTML.gif" alt="图49gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-49-desc"> <p><b>制造顺序对微观结构的形成与保护凸角使用两步蚀刻:(a)沉积和掩模层的模式;(b)硅各向异性腐蚀;(c) Re-deposition掩模层随后模式(d)各向异性蚀刻的第二步;(e)去除掩模层(f) SEM结构组合使用类似的过程步骤的照片(2002年与爱思唯尔的许可、版权)</gydF4y2Bab>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 69" title="69年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5916">69年</一个>]<gydF4y2Bab>。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/49" data-track-dest="link:Figure49 Full size image" aria-label="Full size image figure 49" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div></li> </ol> <p>然而这种技术提供了保护凸角,光刻是繁重的第二步是进行三维表面形貌。三维微结构的性质使得它很难转移模式(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 168" title="168年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5938">168年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 169" title="169年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5941">169年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 171" title="171年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5944">171年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 174" title="174年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5947">174年</一个>]。光刻过程中有三个主要问题在3 d地形:统一的光刻胶涂料、反射紫外线的胎侧倾斜和不均匀的面具和底面之间的差距。首先关心的是使用旋转涂布光刻胶的均匀涂层精密加工中最常用的方法。尽管可以使用电沉积获得均匀的厚度不均匀表面光刻胶,它有其自身的局限性<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 172" title="172年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5950">172年</一个>- - - - - -<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 174" title="174年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5954">174年</一个>]。的电镀光刻胶的光刻胶需要导电基电沉积发生,因此它不能被使用在一个过程的所有阶段。虽然比旋转喷涂方法提供了更好的结果,它也不是一个理想的解决方案外套等三维地形表面均匀厚度抵抗蛀牙有一个很大的差别在相同的样本大小。在此方法中,第二个问题是紫外线的反射在紫外线照射胎侧倾斜。这多余的反射使光刻胶胎侧相反。然而它可以避免使用偏振紫外光,它需要额外的硬件在曝光工具(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 172" title="172年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5957">172年</一个>]。第三个问题是不平的面具,晶圆表面之间的差距。这可能会导致衍射问题,可以改变特征尺寸从面具转移到基板上。</gydF4y2Bap> <ol class="u-list-style-none"> <li><span class="u-custom-list-number">(2)</gydF4y2Baspan><p>第二种方法为制造完美的凸角还涉及两个步骤的腐蚀,需要两个面具<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 70" title="70年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5970">70年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 112" title="112年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5973">112年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5976">128年</一个>,<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 175" title="175年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5979">175年</一个>]。然而,它不需要任何光刻腐蚀的第一步。这两个步骤使用光掩模光刻# 1和# 2的蚀刻的第一步之前使用。图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">50</一个>的SEM显微图显示多个水库通过v型渠道相互连接。胎侧的交叉形成的凸角是完全保护。流程步骤的顺序见图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">51</一个>。氮化层的制造从嗒嗒嗒地开始使用面膜# 1。执行之后,热氧化生长氧化层。这一步氧化叫做局部氧化硅(LOCOS)只暴露硅氧化和剩下的部分是氮化层的保护<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 176" title="176年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e5989">176年</一个>]。现在的氧化是有图案的各向异性腐蚀(图的第一步<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">51</一个>(c))。此后,执行蚀刻深度要求(图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">51</一个>(d))。在这些结构,它可以注意到凹槽对齐就可以形成沿< 110 >纯TMAH,而那些只与< 100 >可能surfactant-added TMAH(或异丙醇添加KOH)作为表面活性剂的加入TMAH(或异丙醇在KOH)减少了削弱在< 100 >边缘。现在,进行热氧化矿床的氧化层暴露硅(第二LOCOS)。氮化层是有选择地删除通过干蚀刻或湿蚀刻在热磷酸(H<gydF4y2Basub>3</gydF4y2Basub>阿宝<gydF4y2Basub>4</gydF4y2Basub>)。如果氮化物蚀刻在热磷酸,样品应该沉浸在缓冲氢氟酸(BHF银行)在短时间内(大约20秒)为了消除氧化层形成氮化在LOCOS过程中(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 177" title="177年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e6003">177年</一个>]。这一步是未遂,因为磷酸氧化腐蚀率相比,是可以忽略的氮化硅腐蚀率。随后,氧化缓冲是蚀刻在BHF银行。现在,第二步采用硅的腐蚀。应该执行这一步的硅蚀刻在TMAH氧化层被用作掩蔽层。目前蚀刻腔的侧壁和凹槽以前相交形成的凸角的形状,不回蚀刻蚀刻钝化的面具。终于在BHF银行氧化层被移除。如扫描电镜照片如图所示<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">50</一个>使用这种方法,结构的组成完美的凸角。然而,制造微流体通道的过程与多个水库在Si{100}晶片,它可以用于其他类型的结构,包含凸角加速度计质量证明等(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 111" title="111年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e6009">111年</一个>]。此外这种技术可以用于Si{110}形成了微观结构与完美的凸角呈现在图<一个d一个t一个- - - - - -tr一个ck="click" data-track-label="link" data-track-action="figure anchor" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4">52</一个>(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e6015">128年</一个>]。因此这是一个通用的过程。在这种方法中,计算两个面具之间的重叠区域使用简单的三角关系。相应的面具的尺寸确定。也许我在这里强调的尺寸使用湿各向异性蚀刻掩模制造的微观结构决定考虑蚀刻的轮胎的侧向削弱和角度。</gydF4y2Bap> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-50" data-title="Figure 50"> <figure> <figcaption> <b id="Fig50" class="c-article-section__figure-caption" data-test="figure-caption-text">图50</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/50" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig50_HTML.gif?as=webp"> <img aria-describedby="Fig50" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig50_HTML.gif" alt="图50gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-50-desc"> <p><b>SEM照片的微流体通道与多个水库完全保护角落使用两步蚀刻和LOCOS过程实现的。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/50" data-track-dest="link:Figure50 Full size image" aria-label="Full size image figure 50" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-51" data-title="Figure 51"> <figure> <figcaption> <b id="Fig51" class="c-article-section__figure-caption" data-test="figure-caption-text">图51</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/51" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig51_HTML.gif?as=webp"> <img aria-describedby="Fig51" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig51_HTML.gif" alt="图51gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-51-desc"> <p><b>制造步骤与多个水库微流体通道的形成与完美的凸角:(a)如果</gydF4y2Bab><sub><b>3</gydF4y2Bab></sub><b>N</gydF4y2Bab><sub><b>4</gydF4y2Bab></sub><b>把晶片;Si (b)模式</gydF4y2Bab><sub><b>3</gydF4y2Bab></sub><b>N</gydF4y2Bab><sub><b>4</gydF4y2Bab></sub><b>使用面膜# 1层;模式(c)热氧化后的氧化层使用面膜# 2 (d)中各向异性腐蚀表面活性剂添加TMAH(或异丙醇添加KOH) (e) Re-oxidation选择性切除Si紧随其后</gydF4y2Bab><sub><b>3</gydF4y2Bab></sub><b>N</gydF4y2Bab><sub><b>4</gydF4y2Bab></sub><b>(f)再一次各向异性蚀刻在纯TMAH (KOH)和去除氧化层。</gydF4y2Bab></p> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/51" data-track-dest="link:Figure51 Full size image" aria-label="Full size image figure 51" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div> <div class="c-article-section__figure js-c-reading-companion-figures-item" data-test="figure" data-container-section="figure" id="figure-52" data-title="Figure 52"> <figure> <figcaption> <b id="Fig52" class="c-article-section__figure-caption" data-test="figure-caption-text">图52</gydF4y2Bab> </figcaption> <div class="c-article-section__figure-content"> <div class="c-article-section__figure-item"> <a class="c-article-section__figure-link" data-test="img-link" data-track="click" data-track-label="image" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/52" rel="nofollow"> <picture> <source type="image/webp" srcset="//media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig52_HTML.gif?as=webp"> <img aria-describedby="Fig52" src="https://media.springernature.com/lw685/springer-static/image/art%3A10.1186%2Fs40486-015-0012-4/MediaObjects/40486_2015_12_Fig52_HTML.gif" alt="图52gydF4y2Ba" loading="lazy"> </picture></a> </div> <div class="c-article-section__figure-description" data-test="bottom-caption" id="figure-52-desc"> <p><b>不同形状的微流体通道与多个水库在Si{110}晶片实现。</gydF4y2Bab>微观结构的边缘对齐<gydF4y2Bab>(一)</gydF4y2Bab>< 110 >和< 112 >方向<gydF4y2Bab>(b)</gydF4y2Bab>< 112 >方向(<一个d一个t一个- - - - - -tr一个ck="click" data-track-action="reference anchor" data-track-label="link" data-test="citation-ref" aria-label="Reference 128" title="128年gydF4y2Ba" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4" id="ref-link-section-d6163027e6138">128年</一个>]。</gydF4y2Bap> </div> </div> <div class="u-text-right u-hide-print"> <a class="c-article__pill-button" data-test="article-link" data-track="click" data-track-label="button" data-track-action="view figure" href="//www.kei-daikouji.com/articles/10.1186/s40486-015-0012-4/figures/52" data-track-dest="link:Figure52 Full size image" aria-label="Full size image figure 52" rel="nofollow"><span>全尺寸图像</gydF4y2Baspan> <svg width="16" height="16" focusable="false" role="img" aria-hidden="true" class="u-icon"> <use xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="#icon-chevron-right"></use> </svg></a> </div> </figure> </div></li> </ol> </div> </div> </section> <section data-title="Conclusions"> <div class="c-article-section" id="Sec11-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="Sec11">结论</gydF4y2Bah2> <div class="c-article-section__content" id="Sec11-content"> <p>这个局部检查重点是凸角的加工方法在{100}和{110}取向硅片使用基于各向异性湿法化学腐蚀硅微加工。在角落里的补偿方法,各种补偿几何图形用于保护角的形成进行了综述和讨论。在这种技术中,空间要求和蚀刻的合成形状凸角是主要问题。{100}的晶片,< 100 >取向在一定条件下补偿设计提供了锋利的边缘角落,但其高空间要求是一个主要缺点,尤其是当弯曲凹槽需要去实现。为了减少空间需求和锋利的凸角,补偿几何设计的叠加使用广场提供了腐蚀剂特征满足特定的需求。正方形的设计需要更少的空间适合在角落里,但它不是适合实现尖角。在表面活性剂添加TMAH溶液,三角形设计是一个最好的选择。腐蚀剂,形成弯曲V-grooves大幅凸角很容易实现。在角落里补偿方法,得出< 100 >梁是合适的选择大幅凸角的形成高浓度TMAH(例如:20 - 25 wt %)和KOH提供空间凸角不是一个限制。在空间限制的情况下,如V-grooves弯曲,表面活性剂添加高浓度TMAH与三角形补偿几何是一个正确的选择。 In order to protect the convex corner on Si{110} surface, <112> oriented beam (or parallelogramic beam) is an optimal compensating geometry owing to its simple design and the same size beams are used at the acute and obtuse corners.</p> <p>除了角补偿方法,两种不同的技术进行了讨论。这些方法是很有用的,想要完全锋利边缘的凸角时是捏造的。与补偿方法,大幅凸角的形成这些方法不需要任何时间控制腐蚀。然而这些技术提供了完美的凸角,他们需要two-mask光刻和两步蚀刻。额外的面具和处理步骤使他们更加昂贵和复杂。</gydF4y2Bap> </div> </div> </section> <div id="MagazineFulltextArticleBodySuffix"> <section aria-labelledby="Bib1" data-title="References"> <div class="c-article-section" 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js-c-reading-companion-sections-item" id="Ack1">确认</gydF4y2Bah2> <div class="c-article-section__content" id="Ack1-content"> <p>这项工作是支持的研究资助的科学和技术(项目号SR / S3 /芝加哥商业交易所/ 072/2011),新德里,印度和日本促进社会科学(jsp)。衷心感谢女士美智子Shindo (k .佐藤教授分泌)为她协助获取权限复制一些数据发表论文和Sajal Sagar辛格先生为他的建议。</gydF4y2Bap> </div> </div> </section> <section aria-labelledby="author-information" data-title="Author information"> <div class="c-article-section" id="author-information-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="author-information">作者信息</gydF4y2Bah2> <div class="c-article-section__content" id="author-information-content"> <h3 class="c-article__sub-heading" id="affiliations">作者和联系</gydF4y2Bah3> <ol class="c-article-author-affiliation__list"> <li id="Aff1"><p class="c-article-author-affiliation__address">物理系、微机电系统和微/纳米系统实验室,印度理工学院海得拉巴,印度海德拉巴</gydF4y2Bap><p class="c-article-author-affiliation__authors-list">但是过犹不及的朋友</gydF4y2Bap></li> <li id="Aff2"><p class="c-article-author-affiliation__address">爱知理工学院机械工程系,丰田、爱知、日本</gydF4y2Bap><p class="c-article-author-affiliation__authors-list">Kazuo佐藤</gydF4y2Bap></li> </ol> <div class="u-js-hide u-hide-print" data-test="author-info"> <span class="c-article__sub-heading">作者</gydF4y2Baspan> <ol class="c-article-authors-search u-list-reset"> <li id="auth-Prem-Pal"><span class="c-article-authors-search__title u-h3 js-search-name">但是过犹不及的朋友</gydF4y2Baspan> <div class="c-article-authors-search__list"> <div class="c-article-authors-search__item c-article-authors-search__list-item--left"> <a href="https://www.biomedcentral.com/search?query=author%23Prem%20Pal" class="c-article-button" data-track="click" data-track-action="author link - publication" data-track-label="link" rel="nofollow">看来作者出版物</一个> </div> <div class="c-article-authors-search__item c-article-authors-search__list-item--right"> <p class="search-in-title-js c-article-authors-search__text">你也可以搜索这个作者<gydF4y2Baspan class="c-article-identifiers"><a class="c-article-identifiers__item" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?cmd=search&term=Prem%20Pal" data-track="click" data-track-action="author link - pubmed" data-track-label="link" rel="nofollow">PubMed</一个><span class="u-hide"></span><a class="c-article-identifiers__item" href="http://scholar.google.co.uk/scholar?as_q=&num=10&btnG=Search+Scholar&as_epq=&as_oq=&as_eq=&as_occt=any&as_sauthors=%22Prem%20Pal%22&as_publication=&as_ylo=&as_yhi=&as_allsubj=all&hl=en" data-track="click" data-track-action="author link - scholar" data-track-label="link" rel="nofollow">谷歌学术搜索</一个></span></p> </div> </div></li> <li id="auth-Kazuo-Sato"><span class="c-article-authors-search__title u-h3 js-search-name">Kazuo佐藤</gydF4y2Baspan> <div class="c-article-authors-search__list"> <div class="c-article-authors-search__item c-article-authors-search__list-item--left"> <a href="https://www.biomedcentral.com/search?query=author%23Kazuo%20Sato" 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<h3 class="c-article__sub-heading" id="corresponding-author">相应的作者</gydF4y2Bah3> <p id="corresponding-author-list">对应到<一个id="corresp-c1" href="mailto:prem@iith.ac.in">但是过犹不及的朋友</一个>。</gydF4y2Bap> </div> </div> </section> <section data-title="Additional information"> <div class="c-article-section" id="additional-information-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="additional-information">额外的信息</gydF4y2Bah2> <div class="c-article-section__content" id="additional-information-content"> <h3 class="c-article__sub-heading">相互竞争的利益</gydF4y2Bah3> <p>作者宣称没有利益冲突。</gydF4y2Bap> <h3 class="c-article__sub-heading">作者的贡献</gydF4y2Bah3> <p>页进行文献检索和写的手稿。KS审查/编辑稿件。两位作者阅读和批准最终的手稿。</gydF4y2Bap> <h3 class="c-article__sub-heading">作者的信息</gydF4y2Bah3> <p>但是过犹不及的朋友他M.Tech博士。在固态材料(SSM) 1999年12月,MEMS领域的博士学位2004年12月,来自新德里印度理工学院(IIT)德里,印度。的<gydF4y2Bai>基础创新和技术转让(FITT), IIT德里</gydF4y2Bai>授予他的论文“最佳行业相关的博士项目−2005”。从2005年7月到2006年6月,他担任博士后研究员延世微系统实验室(YML),机械工程学院,韩国首尔延世大学。他在佐藤实验室微纳系统工程系,名古屋大学、名古屋,日本:从2006年7月到2008年3月作为COE科学家从2008年3月至2010年3月,jsp的家伙。他加入了物理系,2010年4月海德拉巴印度科技学院的助理教授。目前,他正在为副教授。他已经发表了40多篇论文在国际同行评审期刊上的高影响因子。他的研究兴趣包括MEMS技术,基于MEMS传感器,硅微加工,为MEMS薄膜。</gydF4y2Bap> <p>Kazuo佐藤教授毕业于日本横滨国立大学,并在1970年获得了本科。他曾与日立有限公司1970 - 1994年的时期。在此期间,他收到了1982年东京大学博士学位。他开始Si-micromachining研究在1983年和128年国际期刊论文发表在MEMS技术。他于1994年加入名古屋大学作为一个完整的微系统工程系教授。他在2012年成为名古屋大学名誉教授,教授,目前爱知技术研究所、日本。他的研究兴趣包括大部分微加工的Si和石英,MEMS材料的机械特性和MEMS应用程序。他IEEE mems - 97共同主持会议。他是亚洲的编辑器(2008 - 2012),目前是一个杂志编辑委员会成员的微观力学和微工程学。他的创始主席微/纳米科学与工程部门在日本机械工程师学会(JSME)和JSME的荣誉会员。 He also is a senior member of IEEJ, and a fellow of JSPE, and a member of IEEE.</p> </div> </div> </section> <section data-title="Rights and permissions"> <div class="c-article-section" id="rightslink-section"> <h2 class="c-article-section__title js-section-title js-c-reading-companion-sections-item" id="rightslink">权利和权限</gydF4y2Bah2> <div 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